Nanoimprint lithography process using low surface energy mask

A nano-imprint lithography (NIL) imprinting system, comprising:

• a modified imprint mask creation system to created a modified imprint mask;
• a NIL imprinting system configured to apply the modified imprint mask to a NIL material layer;
• a NIL post-processing system configured to perform post-processing operations on an imprinted NIL material layer;
• and
• a controller to transmit instructions to the NIL imprinting system configured to:
• apply a master mold to an imprint mask material to create an imprint mask;
• form a graphitized carbon layer on a surface of the imprint mask to cause a surface energy of the modified imprint mask to fall below a sticking threshold by:
• applying a plasma treatment to the surface of the imprinted mask, and
• after the plasma treatment is applied to the surface of the imprinted mask, exposing the surface of the imprinted mask to ultraviolet (UV) light;
• and
• apply the modified imprint mask to a nano-imprint lithography (NIL) material layer to create an imprinted NIL material layer, the surface energy level of the modified imprint mask causing a shape of the imprinted NIL material layer to remain unchanged when the imprinted ML material layer is detached from the modified imprint mask.