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US 2022/0025548 A1Published application
Silicon carbide ingot and method of fabricating the same
AssigneeGlobalWafers Co., Ltd.
InventorChing-Shan Lin
Life of this patent
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Abstract
A silicon carbide ingot is provided, which includes a seed end, and a dome end opposite to the seed end. In the silicon carbide ingot, a ratio of the vanadium concentration to the nitrogen concentration at the seed end is in a range of 5:1 to 11:1, and a ratio of the vanadium concentration to the nitrogen concentration at the dome end is in a range of 2:1 to 11:1.
Claims15
A silicon carbide crystal ingot, comprising:
- a seed end and a dome end opposite to the seed end, wherein a ratio of vanadium concentration to nitrogen concentration at the seed end is in a range of 5:1 to 11:1, and a ratio of the vanadium concentration to the nitrogen concentration at the dome end is in a range of 2:1 to 11:1.
A method of fabricating a silicon carbide ingot, comprising:
- providing a raw material containing carbon element and silicon element, and a seed crystal located above the raw material into a reactor;
- introducing argon gas and vanadium gas into the reactor;
- heating the reactor and the raw material, so as to form a silicon carbide crystal on the seed crystal;
- and
- cooling the reactor and the raw material, so as to obtain the silicon carbide ingot, wherein the silicon carbide ingot comprises a seed end and a dome end opposite to the seed end, and the seed end is an end of the silicon carbide ingot close to the seed crystal, and the dome end is an end of the silicon carbide crystal ingot far away from the seed crystal.
2 more elements
Dependencies are inferred from the claim text.