Deposition reactor with inductors and electromagnetic shields
AssigneeLpe S.P.A.
InventorsMichele Forzan, Danilo Crippa, Silvio Preti
Life of this patent
Estimating the term…
Abstract
The reactor (100) for deposition of layers of semiconductor material on substrates, comprises: a reaction chamber (110), a susceptor assembly (120) located inside the reaction chamber, and a heating system (130) adapted to heat the susceptor assembly by electromagnetic induction; the heating system (130) comprises a first (131) inductor and a second (132) inductor and a power supply (135) adapted to electrically feed the first and second inductors (131, 132) with alternating currents that are distinct and independent from one another; the reactor (100) further comprises a shielding assembly (140) adapted to limit electromagnetic coupling between the first and the second inductors (131, 132).
Claims15
Reactor for deposition of layers of semiconductor material on substrates comprising:
- a reaction chamber,
- a susceptor assembly located inside the reaction chamber, and
- a heating system adapted to heat the susceptor assembly by electromagnetic induction;
- wherein the heating system comprises a first inductor and a second inductor and a power supply adapted to electrically feed the first and second inductors with alternating currents that are distinct and independent from one another;
- the reactor further comprising a shielding assembly adapted to limit electromagnetic coupling between the first and second inductors.
Dependencies are inferred from the claim text.