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US 2022/0025299 A1Published application
Cleaning solution composition and cleaning method using the same
AssigneeKctech Co., Ltd.
InventorsKun Hee PARK, Yong Ho JEONG, Kyong Jin JUNG, Young Ho YUN
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Abstract
A cleaning solution composition and a cleaning method using the cleaning solution composition are provided. The cleaning solution composition includes a chelating agent including a first organic acid and a second organic acid, and an etching agent including a fluoride compound.
Claims17
A cleaning solution composition comprising:
- a chelating agent comprising a first organic acid and a second organic acid;
- and
- an etching agent comprising a fluoride compound.
Dependencies are inferred from the claim text.