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US 2022/0025261 A1Published application
Etchant composition
AssigneeSoulbrain Co., Ltd.
InventorsJung-ah KIM, Young-chan KIM, Hyo-san LEE, Hoon HAN, Jin-uk LEE, Jung-hun LIM, Ik-hee KIM
Life of this patent
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Abstract
An etchant composition and a method of fabricating a semiconductor device, the composition including an inorganic acid; about 0.01 parts by weight to about 0.5 parts by weight of colloidal silica; about 0.01 parts by weight to about 30 parts by weight of an ammonium-based additive; and about 20 parts by weight to about 50 parts by weight of a solvent, all parts by weight being based on 100 parts by weight of the inorganic acid.
Claims20
An etchant composition, comprising:
- an inorganic acid;
- about 0.01 parts by weight to about 0.5 parts by weight of colloidal silica;
- about 0.01 parts by weight to about 30 parts by weight of an ammonium additive;
- and
- about 20 parts by weight to about 50 parts by weight of a solvent,
- all parts by weight being based on 100 parts by weight of the inorganic acid,
- wherein, when dissolved in the inorganic acid, the colloidal silica has a structure represented by Chemical Formula 1:
- wherein, in Chemical Formula 1,
- m is an integer of 2 to 8, and
- R1, R2, R3, R4, R5, R6, R7, and R8 are each independently a hydrogen atom, a hydroxyl group, or a group represented by Chemical Formula 2, at least one of R1, R2, R3, R4, R5, R6, R7, and R8 being a hydroxyl group or a group represented by Chemical Formula 2,
- wherein, in Chemical Formula 2,
- n is an integer of 0 to 5, and
- R9 and R10 are each independently a hydrogen atom, a hydroxyl group, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C1 to C20 hydroxyalkyl group, a C1 to C20 aminoalkyl group, a C1 to C20 alkoxy group, a C1 to C20 aminoalkoxy group, a nitrile group, or a carboxyl group.
10 more elements
An etchant composition, comprising:
- an inorganic acid;
- about 0.01 parts by weight to about 0.5 parts by weight of colloidal silica;
- about 0.1 parts by weight to about 20 parts by weight of an ammonium additive;
- and
- about 20 parts by weight to about 50 parts by weight of a solvent,
- all parts by weight being based on 100 parts by weight of the inorganic acid,
- wherein, when dissolved in the inorganic acid, the colloidal silica has a structure represented by Chemical Formula 1:
- wherein, in Chemical Formula 1,
- m is an integer of 2 to 8, and
- R1, R2, R3, R4, R5, R6, R7, and R8 are each independently a hydrogen atom, a hydroxyl group, or a group represented by Chemical Formula 2, at least one of R1, R2, R3, R4, R5, R6, R7, and R8 being a hydroxyl group or a group represented by Chemical Formula 2,
- wherein, in Chemical Formula 2,
- n is an integer of 0 to 5, and
- R9 and R10 are each independently a hydrogen atom, a hydroxyl group, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C1 to C20 hydroxyalkyl group, a C1 to C20 aminoalkyl group, a C1 to C20 alkoxy group, a C1 to C20 aminoalkoxy group, a nitrile group, or a carboxyl group, and
- wherein the etchant composition further comprises about 0.01% by weight (wt %) to about 1 wt % of a fluorine compound.
11 more elements
An etchant composition, comprising:
- an inorganic acid;
- about 0.01 parts by weight to about 0.5 parts by weight of colloidal silica;
- about 0.01 parts by weight to about 30 parts by weight of an ammonium additive;
- and
- about 20 parts by weight to about 50 parts by weight of a solvent,
- all parts by weight being based on 100 parts by weight of the inorganic acid,
- wherein, when dissolved in the inorganic acid, the colloidal silica has a structure represented by Chemical Formula 1:
- wherein, in Chemical Formula 1,
- m is an integer of 2 to 8, and
- R1, R2, R3, R4, R5, R6, R7, and R8 are each independently a hydrogen atom, a hydroxyl group, or a group represented by Chemical Formula 2, at least one of R1, R2, R3, R4, R5, R6, R7, and R8 being a hydroxyl group or a group represented by Chemical Formula 2,
- wherein, in Chemical Formula 2,
- n is an integer of 0 to 5, and
- R9 and R10 are each independently a hydrogen atom, a hydroxyl group, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C1 to C20 hydroxyalkyl group, a C1 to C20 aminoalkyl group, a C1 to C20 alkoxy group, a C1 to C20 aminoalkoxy group, a nitrile group, or a carboxyl group,
- wherein the colloidal silica has an average particle size of about 1 nm to about 40 nm. and
- wherein the etchant composition has a pH of 1 or less.
12 more elements
Dependencies are inferred from the claim text.