Dressing device and method for dressing a grinding tool

Abstract

A dressing device for profiling and sharpening a grinding tool includes a rotatable sharpening tool and a rotatable profiling tool axially offset from and settable relative to the rotatable sharpening tool. In one embodiment, the rotatable sharpening tool and the rotatable profiling tool have a common rotational axis, and the tools are settable along the common rotational axis. In another embodiment, a profiling tool axis of rotation is parallel to a sharpening tool axis of rotation. A method for dressing a grinding tool is also disclosed. The method includes profiling and sharpening the grinding tool with a single dressing device having a rotatable profiling tool with a first feed rate and a first advancement rate, and a rotatable sharpening tool with a second feed rate and a second advancement rate. The two feed rates or the two advancement rates are different.

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