Control device, system and control method
AssigneeTokyo Electron Limited
InventorsYuichi TAKENAGA, Takahito KASAI, Youngtai KANG
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Abstract
A control device includes a reception unit configured to receive a film characteristic at a plurality of positions of a film formed on a substrate by a film forming processing based on a processing recipe, an optimization processing unit configured to execute an optimization calculation of the processing recipe based on the film characteristic, a diagnosis unit configured to diagnose a validity of an in-plane shape of the film characteristic based on the film characteristic, and a determination unit configured to determine whether or not to notify a user of an encouraging action based on a diagnosis result by the diagnosis unit.
Claims11
A control device comprising:
- reception circuitry configured to receive a film characteristic at a plurality of positions of a film formed on a substrate by a film forming processing based on a processing recipe;
- optimization processing circuitry configured to execute an optimization calculation of the processing recipe based on the film characteristic;
- diagnosis circuitry configured to diagnose a validity of an in-plane shape of the film characteristic based on the film characteristic;
- and
- determination circuitry configured to determine whether or not to notify a user of an encouraging action based on a diagnosis result by the diagnosis circuitry.
A system comprising:
- a film forming apparatus including a processing chamber configured to execute a film forming processing on a substrate based on a processing recipe;
- a controller configured to perform an optimization calculation of the processing recipe;
- and
- a measuring meter configured to measure a film characteristic of a film formed on the substrate on which the film forming processing has been executed,
- wherein the film forming apparatus, the controller, and the measuring meter are connected to each other via a network, and
- the controller includes:
- reception circuitry configured to receive the film characteristic at a plurality of positions of the film formed on the substrate by the film forming processing based on the processing recipe;
- optimization processing circuitry configured to execute the optimization calculation of the processing recipe based on the film characteristic;
- diagnosis circuitry configured to diagnose a validity of an in-plane shape of the film characteristic based on the film characteristic;
- and
- determination circuitry configured to determine whether or not to notify a user of an encouraging action based on a diagnosis result by the diagnosis circuitry.
A control method comprising:
- receiving a film characteristic at a plurality of positions of a film formed on a substrate by a film forming processing based on a processing recipe;
- executing an optimization calculation of the processing recipe based on the film characteristic;
- diagnosing a validity of an in-plane shape of the film characteristic based on the film characteristic;
- and
- determining whether or not to notify a user of an encouraging action based on a diagnosis result in the diagnosing.
Dependencies are inferred from the claim text.