Apparatus for treating substrate, method for measuring height difference between lift pins, and computer readable recording medium having processing program stored therein

An apparatus for treating a substrate, the apparatus comprising:

• a chamber configured to provide a treatment space in which the substrate is treated;
• a support unit provided in the treatment space and configured to support the substrate, the support unit including a plurality of lift pins configured to move upward or downward to locate the substrate;
• a transfer robot configured to load the substrate into the treatment space or unload the substrate from the treatment space;
• a position measurement sensor configured to measure a first center position being a position of the center of the substrate with respect to a reference position that is measured before the transfer robot loads the substrate onto the support unit and a second center position being a position of the center of the substrate with respect to the reference position that is measured after the transfer robot picks up the substrate unloaded from the support unit;
• and
• a processor configured to derive a difference in height between at least one of the plurality of lift pins and the other lift pins from a vector difference between the first center position and the second center position.