Magnetic memory device and method for fabricating the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHee Ju SHIN, Sang Hwan PARK, Se Chung OH, Ki Woong KIM, Hyeon Woo SEO
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AssigneeSamsung Electronics Co., Ltd.
InventorsHee Ju SHIN, Sang Hwan PARK, Se Chung OH, Ki Woong KIM, Hyeon Woo SEO
Estimating the term…
A magnetic memory device includes a pinned layer, a free layer, a tunnel barrier layer between the pinned layer and the free layer, a first oxide layer spaced apart from the tunnel barrier layer with the free layer therebetween, and a second oxide layer spaced apart from the free layer with the first oxide layer therebetween. The first oxide layer includes an oxide of a first material and may have a thickness of 0.3 Å to 2.0 Å. The second oxide layer may include an oxide of a second material and may have a thickness of 0.1 Å to 5.0 Å. A first oxygen affinity of the first material may be greater than a second oxygen affinity of the second material.
A magnetic memory device comprising:
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9-10. (canceled)
A magnetic memory device comprising:
17-19. (canceled)
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A magnetic memory device comprising:
28-31. (canceled)
Dependencies are inferred from the claim text.