Resist composition and method of forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsMasatoshi ARAI, KhanhTin NGUYEN
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Abstract
A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1). In the formula, W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, and Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, Ra1 to Ra3 represents a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Ra1 to Ra3 are bonded to each other to form an aliphatic ring, not all of Ra1 to Ra3 are hydrogen atoms, n represents 0 or 1
Claims5
A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
- a resin component (A1) which exhibits changed solubility in a developing solution under action of acid,
- wherein the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a01-1):
- wherein W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, wherein part or all of hydrogen atoms which the monocyclic or polycyclic alicyclic group has may be substituted with a substituent, Ra1 to Ra3 each independently represents a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Ra1 to Ra3 are bonded to each other to form an aliphatic ring, provided that not all of Ra1 to Ra3 are hydrogen atoms, and n represents 0 or 1.
Dependencies are inferred from the claim text.