Positive working photosensitive material

A positive working photosensitive composition comprising:

• a) at least one photoacid generator;
• b) at least one Novolak polymer;
• c) at least one acrylate polymer, comprising a component having structure (I),
• wherein R1 to R6 are, independently, —H, or —CH3, A is a linear or branched C2 to C10 alkylene group, B is a C1 to C12 primary or secondary unsubstituted linear, branched, cyclic or alicyclic alkyl group, C is a C1 to C12 primary or secondary unsubstituted linear, branched, cyclic or alicyclic alkyl group, D is a linking group that is a direct valence bond, or a linear or branched C1 to C10 alkylene group, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2 to C10 alkylene group, G is an acid cleavable group, t is 0 mole % to about 40 mole %, v is 0 mole % to about 15 mole %, w is 0 mole % to about 45 mole %, x is 0 mole % to about 80 mole %, y is about 20 mole % to about 50 mole % and z is about 20 mole % to about 50 mole %, and further wherein the sum of t, v, w, x, y and z equals 100 mole %;
• d) at least one glycidyl hydroxy benzoic acid condensate material comprising one or more compounds having structure (II),
• wherein,
• W is an organic moiety having a molecular weight of 600 or less, wherein W forms an ether bond with the oxygen to which it is bound,
• m is an integer from 1 to 3 and
• n is an integer from 1 to 4, and further provided that
• when m is 1, n is 3 or 4,
• and when m is 2 or 3, n is an integer from 1 to 4,
• n′ is 0 or 1,
• e) at least one heterocyclic thiol compound comprising a ring structure chosen from the general structures (Ill), (IIIa) or (IIIb), or tautomers thereof;
• and
• wherein,
• said ring structure is a single ring structure having from 4 to 8 atoms, or a multi ring structure having from 5 to 20 atoms;
• and wherein the single ring structure, or the multi ring structure comprises an aromatic, non-aromatic, or heteroaromatic ring, and
• in said structure (III), X is selected from the group consisting of C(Rt1)(Rt2), O, S, Se, and Te;
• in said structure (IIIa), Y is selected from the group consisting of C(Rt3) and N;
• in said structure (IIIb), Z is selected from the group consisting of C(Rt3) and N;
• and
• Rt1, Rt2, and Rt3 are independently selected from the group consisting of H, a substituted alkyl group having 1 to 8 carbon atoms, an unsubstituted alkyl group having 1 to 8 carbon atoms, a substituted alkenyl group having 2 to 8 carbon atoms, unsubstituted alkenyl group having 2 to 8 carbon atoms, a substituted alkynyl group having 2 to 8 carbon atoms, unsubstituted alkynyl group having 2 to 8 carbon atoms, a substituted aromatic group having 6 to 20 carbon atoms, a substituted heteroaromatic group having 3 to 20 carbon atoms, unsubstituted aromatic group having 6 to 20 carbon atoms and unsubstituted heteroaromatic group having 3 to 20 carbon atoms;
• f) at least one solvent.