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US 2022/0017554 A1Published application
Compound, raw material for forming thin film, method for manufacturing thin film, and amidine compound
AssigneeAdeka Corporation
InventorsTomoharu YOSHINO, Nana OKADA, Akihiro NISHIDA, Atsushi YAMASHITA
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Abstract
A raw material for forming a thin film, comprising a compound represented by General Formula (1) below. (in the formula, R1 represents a linear or branched alkyl group having 1 to 5 carbon atoms, R2 represents hydrogen or a linear or branched alkyl group having 1 to 5 carbon atoms, R3 and R4 each independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, A represents an alkanediyl group having 1 to 4 carbon atoms and M represents copper, iron, nickel, cobalt or manganese.)
Claims5
1-5. (canceled)
A compound represented by Formula (1) below:
- wherein R1 represents an isopropyl group, R2 represents a methyl group, R3 and R4 each independently represent a linear or branched alkyl group having 1 to 5 carbon atoms, A represents a propane-1,2-diyl group and M represents copper, nickel, cobalt or manganese.
Dependencies are inferred from the claim text.