Plasma processing apparatus and substrate support of plasma processing apparatus

A substrate support of a plasma processing apparatus, comprising:

• a wafer placement surface on which a wafer is placed;
• a ring placement surface on which a first ring and a second ring are placed, with the second ring disposed at an outer peripheral side of the first ring without overlapping with the first ring in a vertical direction, the ring placement surface having a hole at a boundary between the first ring and the second ring and provided at an outer peripheral side of the wafer placement surface;
• a lifter pin having a first holding portion and a second holding portion, the second holding portion being unitary with and extending axially from a base end of the first holding portion and having a protruding portion protruding from an outer circumference of the first holding portion, and accommodated in the hole of the ring placement surface with the first holding portion facing the ring placement surface;
• and
• a driving mechanism configured to raise and lower the lifter pin.