Process kit with protective ceramic coatings for hydrogen and nh3 plasma application
AssigneeApplied Materials, Inc.
InventorsJian WU, Lara A. HAWRYLCHAK, Ren-Guan DUAN, Bernard L. HWANG, Malcolm J. BEVAN, Wei LIU
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Abstract
A method and apparatus for the use of hydrogen plasma treatments is described herein. The process chamber includes a plurality of chamber components. The plurality of chamber components may be coated with a yttrium zirconium oxide composition, such as a Y2O3—ZrO2 solid solution. Some of the plurality of chamber components are replaced with a bulk yttrium zirconium oxide ceramic. Yet other chamber components are replaced with similar components of different materials.
Claims20
An apparatus for substrate processing comprising:
- a chamber body;
- a lower liner disposed within the chamber body;
- an upper liner disposed on top of the lower liner and within the chamber body;
- a liner door disposed through the upper liner and the chamber body, wherein each of the lower liner, the upper liner, and the liner door further comprise a spray coated yttrium zirconium oxide layer disposed thereon;
- a chamber lid disposed on top of the chamber body;
- and
- a gas nozzle disposed through the chamber lid, wherein the gas nozzle further comprises a bulk ceramic gas nozzle.
An apparatus for substrate processing comprising:
- a chamber body;
- a lower liner disposed within the chamber body;
- an upper liner disposed on top of the lower liner and within the chamber body;
- a liner door disposed through the upper liner and the chamber body, wherein each of the lower liner, the upper liner, and the liner door further comprise a spray coated yttrium zirconium oxide layer disposed thereon, wherein the yttrium zirconium oxide further comprises a Y2O3—ZrO2 solid solution;
- a chamber lid disposed on top of the upper liner;
- a gas nozzle disposed through the chamber lid, wherein the gas nozzle further comprises a bulk ceramic gas nozzle;
- and
- one or more nickel plated or stainless steel gaskets disposed between the lower liner and the upper liner, the upper liner and the chamber lid, and the lower liner and the substrate support pedestal.
An apparatus for substrate processing comprising:
- a chamber body:
- a lower liner disposed within the chamber body;
- an upper liner disposed on top of the lower liner and within the chamber body;
- a liner door disposed through the upper liner and the chamber body, wherein each of the lower liner, the upper liner, and the liner door further comprise a spray coated yttrium zirconium oxide layer disposed thereon;
- a chamber lid disposed on top of the upper liner;
- a gas nozzle disposed through the chamber lid, wherein the gas nozzle further comprises a bulk ceramic gas nozzle;
- an induction coil disposed above the chamber lid;
- and
- a shielding electrode disposed between the induction coil and the chamber lid, wherein
- the thickness of the spray coated yttrium zirconium oxide layer is about 25 microns to about 300 microns and the spray coated yttrium zirconium oxide layer is a purified yttrium zirconium oxide coating with a concentration of 99% or more Y2O3 and ZrO2.
Dependencies are inferred from the claim text.