Etching uniformity regulating device and method
AssigneeJiangsu Leuven Instruments Co. Ltd
InventorsXiaobo LIU, Xuedong LI, Yong QIU, Na LI, Yonggang HOU, Dongdong HU, Lu CHEN, Kaidong XU
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Abstract
An etching uniformity regulating device and method. The device comprises an inductor and a capacitor connected in parallel. One end of the etching uniformity regulating device is connected to a built-in ring located at the edge of an electrostatic chuck of an etching machine, and the other end is grounded. The purpose of controlling the edge electric field is achieved by regulating a capacitance of the capacitor, so as to regulate the etching rate of the edge, thereby achieving etching uniformity.
Claims8
An etching uniformity regulating device, comprising:
- an inductor and a capacitor connected in parallel, wherein one end of the etching uniformity regulating device is connected to an built-in ring located at the edge of an electrostatic chuck of an etching machine and another end is grounded.
Dependencies are inferred from the claim text.