Voltage waveform generator for plasma processing apparatuses
AssigneeProdrive Technologies B.V.
InventorsAntonius Wilhelmus Hendricus Johannes DRIESSEN, Wouter Johan Hendrik VAN GENNIP
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Abstract
A plasma processing apparatus may include a mechanism for generating a plasma, a processing platform for supporting a substrate to be processed, and a voltage waveform generator having an output electrically coupled to the processing platform. The voltage waveform generator includes a plurality of first buck converters arranged in parallel and coupled to the output. The first buck converters include actively switchable semiconductor switches. A control unit is configured to operate the actively switchable semiconductor switches through pulse width modulation signals, and the control unit is configured to operate the plurality of first buck converters in an interleaved manner.
Claims22
A plasma processing apparatus, comprising:
- a plasma reactor configured to generate a plasma,
- a processing platform configured to support a substrate to be processed, and
- a voltage waveform generator comprising an output electrically coupled to the processing platform,
- wherein the voltage waveform generator comprises:
- a plurality of first buck converters arranged in parallel and coupled to the output, the first buck converters comprising actively switchable semiconductor switches, and
- a control unit configured to operate the actively switchable semiconductor switches through pulse width modulation signals,
- wherein the control unit is configured to operate the plurality of first buck converters in an interleaved manner.
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22-23. (canceled)
Dependencies are inferred from the claim text.