Hydrogen co-gas when using a chlorine-based ion source material

An ion implantation system, comprising:

• a chlorine-based source material;
• an ion source configured to ionize the chlorine-based source material and form an ion beam therefrom, and whereby the ionization of the chlorine-based source material further forms a by-product comprising a non-conducting material containing chlorine;
• a hydrogen introduction apparatus configured to introduce a reducing agent comprising hydrogen to the ion source, wherein the reducing agent is configured to alter a chemistry of the non-conducting material to produce a volatile gas by-product;
• a beamline assembly configured to selectively transport the ion beam;
• and
• an end station configured to accept the ion beam for implantation of ions into a workpiece.

A method for implanting aluminum ions into a workpiece, the method comprising:

• vaporizing an aluminum trichloride source material;
• providing the vaporized aluminum trichloride source material to an ion source of an ion implantation system;
• providing a hydrogen co-gas to the ion source;
• ionizing the aluminum trichloride source material in the ion source, wherein the hydrogen co-gas reacts with the vaporized aluminum trichloride source material within the ion source to produce volatile hydrogen chloride gas;
• removing the volatile hydrogen chloride gas via a vacuum system;
• and
• implanting aluminum ions from the ionized aluminum trichloride source material into a workpiece.

A method for implanting ions into a workpiece, the method comprising:

• vaporizing a chlorine-based source material;
• providing the vaporized chlorine-based source material to an ion source of an ion implantation system;
• providing a hydrogen co-gas to the ion source;
• ionizing the chlorine-based source material in the ion source, wherein the hydrogen co-gas reacts with the vaporized chlorine-based source material within the ion source to produce volatile hydrogen chloride gas;
• removing the volatile hydrogen chloride gas via a vacuum system;
• and
• implanting ions from the chlorine-based source material into a workpiece.