Method for producing a lithography coating film forming-composition
AssigneeNissan Chemical Corporation
InventorsTakumi OYA, Hiroki YAMAGUCHI, Suguru SASSA
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Abstract
A method for producing an ion-exchange resin having a water content of 5% by weight or less, a method for producing a lithography coating film forming-composition using the ion-exchange resin, and a method for washing the ion-exchange resin. The methods include the step of passing an organic solvent having a water content of 150 ppm or less through an ion-exchange resin precursor having a water content of 40% by weight or more, where a dehydration efficiency defined by the following equation is 5 or more: Dehydration efficiency=Dehydration rate (%)/[Weight of the organic solvent used per unit weight of the ion-exchange resin precursor (kg/kg)×Washing time (h)].
Claims10
A method for producing an ion-exchange resin having a water content of 5% by weight or less, comprising the step of passing an organic solvent having a water content of 150 ppm or less through an ion-exchange resin precursor having a water content of 40% by weight or more,
- wherein a dehydration efficiency defined by the following equation is 5 or more:
- Dehydration efficiency=Dehydration rate (%)/[Weight of the organic solvent used per unit weight of the ion-exchange resin precursor (kg/kg)×Washing time (h)].
A method for washing an ion-exchange resin, comprising the step of passing an organic solvent having a water content of 150 ppm or less through the ion-exchange resin,
- wherein a dehydration efficiency defined by the following equation before and after washing the ion-exchange resin is 5 or more:
- Dehydration efficiency=Dehydration rate (%)/[Weight of the organic solvent used per unit weight of the ion-exchange resin precursor (kg/kg)×Washing time (h)].
Dependencies are inferred from the claim text.