Resist composition, method of forming resist pattern, compound, and resin
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsKoshi Onishi, Seiji Todoroki
Life of this patent
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Abstract
A resist composition containing a resin component (A1) exhibiting changed solubility in a developing solution under action of acid, the resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a01-1). In the formula, W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, and Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, where the alicyclic group has an oxygen atom or a sulfur atom in the ring structure, Ra1 to Ra3 each independently represents a hydrocarbon group having 1 to 10 carbon atoms which may have a substituent.
Claims7
A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
- a resin component (A1) which exhibits changed solubility in a developing solution under action of acid,
- wherein the resin component (A1) has a constitutional unit (a01) derived from a compound represented by General Formula (a01-1):
- wherein W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, the alicyclic group has an oxygen atom or a sulfur atom in a ring skeleton thereof, part or all of hydrogen atoms which the alicyclic group has may be substituted with a substituent, Ra1 to Ra3 each independently represent a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Ra1 to Ra3 are bonded to each other to form an aliphatic ring.
A compound represented by General Formula (a01-1):
- wherein W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, the alicyclic group has an oxygen atom or a sulfur atom in a ring skeleton thereof, part or all of hydrogen atoms which the alicyclic group has may be substituted with a substituent, and Ra1 to Ra3 each independently represent a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Ra1 to Ra3 are bonded to each other to form an aliphatic ring.
A resin comprising a constitutional unit (a01) derived from a compound represented by General Formula (a01-1):
- wherein W01 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, Xt represents a group that forms a monocyclic or polycyclic alicyclic group together with Ct, the alicyclic group has an oxygen atom or a sulfur atom in a ring skeleton thereof, part or all of hydrogen atoms which the alicyclic group has may be substituted with a substituent, and Ra1 to Ra3 each independently represent a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Ra1 to Ra3 are bonded to each other to form an aliphatic ring.
Dependencies are inferred from the claim text.