Color filter substrate, manufacturing method thereof, and display device

A manufacturing method of a color filter substrate, comprising:

• forming a black matrix on a substrate, the black matrix defining a plurality of first light-transmitting regions, a plurality of second light-transmitting regions and a plurality of third light-transmitting regions on the substrate;
• forming a color resist layer on the substrate where the black matrix is formed, the color resist layer comprising a first color resist, a second color resist and a third color resist arranged in the first light-transmitting regions, the second light-transmitting regions and the third light-transmitting regions respectively, the first color resist covering the black matrix between two adjacent first light-transmitting regions, the second color resist covering the black matrix between two adjacent second light-transmitting regions, and the third color resist in two adjacent third light-transmitting regions being separated by the black matrix, wherein a light transmittance of the third color resist is less than a light transmittance of the first color resist and a light transmittance of the second color resist;
• and
• forming a common electrode layer on the substrate where the color resist layer is formed.

A display device, comprising a color filter substrate and an array substrate arranged oppositely, and a liquid crystal layer arranged between the color filter substrate and the array substrate, wherein the color filter substrate comprises:

• a substrate;
• a black matrix arranged on a surface of the substrate and defining a plurality of first light-transmitting regions, a plurality of second light-transmitting regions and a plurality of third light-transmitting regions on the substrate;
• a color resist layer comprising a first color resist, a second color resist and a third color resist arranged in the first light-transmitting regions, the second light-transmitting regions and the third light-transmitting regions respectively, the first color resist covering the black matrix between two adjacent first light-transmitting regions, the second color resist covering the black matrix between two adjacent second light-transmitting regions, and the third color resist in two adjacent third light-transmitting regions being separated by the black matrix, wherein a light transmittance of the third color resist is less than a light transmittance of the first color resist and a light transmittance of the second color resist;
• and
• a common electrode layer arranged on one side of the color resist layer facing away from the black matrix.