Back to results
US 2022/0010207 A1Published application
Intermediate raw material, and polishing composition and composition for surface treatment using the same
AssigneeFujimi Incorporated
InventorsTsutomu YOSHINO, Ayano YAMAZAKI, Satoru YARITA, Shogo ONISHI, Yasuto ISHIDA
Life of this patent
Estimating the term…
Abstract
An intermediate raw material according to the present invention includes a charge control agent having a critical packing parameter of 0.6 or more and a dispersing medium and a pH of the intermediate raw material is less than 7.
Claims9
-10. (canceled)
A polishing composition which used for polishing an object to be polished, comprising a charge control agent having a critical packing parameter of 0.6 or more, a dispersing medium, and abrasive grains, wherein pH of the polishing composition is less than 7.
Dependencies are inferred from the claim text.