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US 2022/0010072 A1Published application
Film forming material for lithography, composition for film formation for lithography, underlayer film for lithography, and method for forming pattern
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsKouichi YAMADA, Junya HORIUCHI, Takashi MAKINOSHIMA, Masatoshi ECHIGO
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Abstract
A film forming material for lithography comprising a maleimide resin represented by the following formula (1A)
Claims19
A film forming material for lithography comprising a maleimide resin represented by the following formula (1A):
- wherein
- each R is independently any one group selected from the group consisting of a hydrogen atom and an alkyl group having 1 to 4 carbon atoms;
- each Z is independently a trivalent or tetravalent hydrocarbon group having 1 to 100 carbon atoms and optionally containing a heteroatom;
- each R1 is independently a group having 0 to 10 carbon atoms and optionally containing a heteroatom;
- each m1 is independently an integer of 0 to 4;
- and
- n is an integer of 1 or more.
4 more elements
Dependencies are inferred from the claim text.