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US 2021/0410264 A1Published application
Nitrogen oxide reduction apparatus and gas treating apparatus
AssigneeEdwards Korea Ltd.
InventorsYun Soo Choi, Chan Kyoo Ko, Simone Magni
Life of this patent
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Abstract
A gas treating apparatus may include a reaction chamber configured to process a gas supplied from an outside by a plasma, the processed gas containing a nitrogen oxide, and a nitrogen oxide reduction apparatus connected to the reaction chamber. The nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.
Claims17
1:
- A gas treating apparatus comprising:
- a reaction chamber configured to process a gas supplied from an outside by a plasma, the processed gas containing a nitrogen oxide;
- and
- a nitrogen oxide reduction apparatus connected to the reaction chamber,
- wherein the nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.
2 more elements
2:
- The gas treating apparatus of claim 1, wherein the cooling unit includes one or more gas injection nozzles configured to inject a low-temperature gas.
3:
- The gas treating apparatus of claim 2, wherein the gas injection nozzles are provided at multiple locations of the nitrogen oxide reduction apparatus, and the low-temperature gas is an inert gas.
4:
- The gas treating apparatus of claim 2, wherein the nitrogen oxide reduction apparatus further includes a cylindrical housing and an annular gas supply ring provided inside the cylindrical housing, and
- wherein the one or more gas injection nozzles are provided on the gas supply ring.
5:
- The gas treating apparatus of claim 3, wherein the inert gas contains at least one of nitrogen gas and argon gas.
6:
- The gas treating apparatus of claim 1, wherein the cooling unit includes a heat exchanger.
7:
- A nitrogen oxide reduction apparatus for reducing a nitrogen oxide contained in a gas processed by a plasma, the nitrogen oxide reduction apparatus comprising:
- a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.
8:
- The nitrogen oxide reduction apparatus of claim 7, wherein the cooing unit includes one or more gas injection nozzles configured to inject a low-temperature gas.
9:
- The nitrogen oxide reduction apparatus of claim 8, wherein the gas injection nozzles are provided at multiple locations of the nitrogen oxide reduction apparatus, and the low-temperature gas is an inert gas.
10:
- The nitrogen oxide reduction apparatus of claim 8, further comprising a cylindrical housing and an annular gas supply ring provided inside the cylindrical housing, and
- wherein the one or more gas injection nozzles are provided on the gas supply ring.
11:
- The nitrogen oxide reduction apparatus of claim 7, wherein the cooling unit includes a heat exchanger.
12:
- A gas treating apparatus comprising:
- a plasma generating apparatus configured to generate a plasma;
- a reaction chamber connected to the plasma generating apparatus and configured to process a gas supplied from outside by the plasma, the processed gas containing a nitrogen oxide;
- and
- a nitrogen oxide reduction apparatus connected to the reaction chamber,
- wherein the nitrogen oxide reduction apparatus includes a cooling unit configured to cool the processed gas to a temperature lower than a nitrogen oxide generation temperature.
3 more elements
13:
- The gas treating apparatus of claim 12, further comprising a pipe having a water injection nozzle,
- wherein the nitrogen oxide reduction apparatus is positioned between the reaction chamber and the pipe.
14:
- The gas treating apparatus of claim 13, wherein the plasma generating apparatus includes:
- a cathode assembly including a cathode;
- an anode assembly including an anode having therein a plasma generation space;
- and
- one or more magnetic force generators configured to generate a magnetic force,
- wherein the anode assembly has one end portion in which a gas supply path is provided and the other end portion having an opening, the gas supply path configured to supply a plasma generating gas to the plasma generation space, and
- wherein the gas supply path is configured to generate a vortex of the plasma generating gas in the plasma generation space and the one or more magnetic force generators are arranged such that the magnetic force is generated in a direction opposite to a rotational direction of the vortex of the plasma generating gas.
4 more elements
15:
- The gas treating apparatus of claim 14, wherein the one or more magnetic force generators are arranged such that the magnetic force is applied to an arc spot generated between the cathode and the anode in the direction opposite to the rotational direction of the vortex of the plasma generating gas.
16:
- The gas treating apparatus of claim 14, wherein the one or more magnetic force generators are arranged such that polarities thereof become opposite to each other in a direction of an axis of the anode assembly.
17:
- The gas treating apparatus of claim 16, wherein, when viewed from the opening toward the gas supply path, N poles of the one or more magnetic force generators are directed toward the opening when the rotational direction of the vortex of the plasma generating gas is a counterclockwise direction and S poles of the one or more magnetic force generators are directed toward the opening when the rotational direction of the vortex of the plasma generating gas is a clockwise direction.