Polyurethane for polishing layers, polishing layer, polishing pad and method for modifying polishing layer
AssigneeKuraray Co., Ltd.
InventorsAzusa SUNAYAMA, Mitsuru KATO, Minori TAKEGOSHI, Chihiro OKAMOTO, Shinya KATO
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Abstract
Disclosed is a polyurethane for use in a polishing layer, including a carboxylic acid ester group, and a polyurethane preferably having a carboxylic acid ester group in at least one of a side chain, a main chain terminal, and a main chain skeleton is preferably used. Also disclosed is a method for modifying a polishing layer, including the steps of: preparing a polishing layer including a polyurethane having a carboxylic acid ester group; and hydrolyzing the carboxylic acid ester group of the polyurethane, to produce a carboxyl group.
Claims21
A polyurethane for use in a polishing layer, comprising
- a carboxylic acid ester group.
(canceled)
A method for modifying a polishing layer, the method comprising:
- preparing the polishing layer including a polyurethane having a carboxylic acid ester group;
- and
- hydrolyzing the carboxylic acid ester group of the polyurethane to produce a carboxyl group.
A polishing layer, comprising
- a molded body of a thermoplastic polyurethane having a carboxyl group,
- wherein the polishing layer has a zeta potential of −1.0 mV or less at a pH of 3.0 to 8.0.
Dependencies are inferred from the claim text.