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US 2021/0351033 A1Published application
Epitaxial growth template using carbon buffer on sublimated sic substrate
AssigneeMassachusetts Institute of Technology
InventorsJeehwan Kim, Wei Kong
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Abstract
Apparatus, systems, and methods for forming semiconductor materials (e.g., using nanofabrication) are generally described. In one example, a method comprises formation of a carbon buffer layer on a first substrate and a graphene layer on the carbon buffer layer by silicon sublimation, followed by removing the graphene layer so as to expose the carbon buffer layer and form a fabrication platform.
Claims12
A method, comprising:
- forming a carbon buffer layer on a first substrate and a graphene layer on the carbon buffer layer;
- and
- removing the graphene layer so as to expose the carbon buffer layer and form a fabrication platform.
Dependencies are inferred from the claim text.