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US 2021/0341871 A1Published application
Cleaning of print apparatus components
AssigneeHewlett-Packard Development Company, L.P.
InventorsLavi Cohen, Michael Vinokur, Asaf Shoshanl
Life of this patent
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Abstract
In an example of the disclosure, a print apparatus component to be cleaned is rotated about a rotational axis. A cleaning element having a cleaning surface in contact with the print apparatus component is rotated. The cleaning element is oscillated in a direction parallel to the rotational axis. Rotation and oscillation of the cleaning element are varied according to a predetermined function to remove a residue from the print apparatus component.
Claims15
A method, comprising:
- rotating a print apparatus component to be cleaned about a rotational axis;
- rotating a cleaning element having a cleaning surface in contact with the print apparatus component;
- oscillating the cleaning element in a direction parallel to the rotational axis;
- and
- varying the rotation and the oscillation of the cleaning element according to a predetermined function to remove a residue from the print apparatus component.
2 more elements
A system for cleaning a print apparatus component, comprising:
- a cleaning element having an abrasive cleaning surface, the cleaning element to contact a print apparatus component that rotates in a first rotational axis;
- a rotational driver to cause the cleaning element to rotate about a second rotational axis that is parallel to the first rotational axis;
- an oscillational driver to cause the cleaning element to oscillate in an oscillation direction parallel to the first rotational axis;
- and
- a controller to cause the rotational driver and the oscillational driver to move the cleaning element to remove a residue from the print apparatus component.
2 more elements
A print apparatus comprising:
- a drum mounted on a drum axle to rotate along first rotational axis, wherein the drum includes a photoconductive surface;
- a cleaning cylinder mounted on a cylinder axle to rotate along a second rotational axis parallel to the first rotational axis, the cleaning cylinder having an abrasive cleaning surface that is to contact the photoconductive surface;
- a cleaning cylinder movement mechanism, the mechanism
- to cause the cleaning cylinder to rotate about the second rotational axis;
- to cause the cleaning cylinder to oscillate in an oscillation direction that is parallel to the first rotational axis, and
- a controller to vary the oscillation of the cleaning cylinder in the oscillation direction and the rotation of the cleaning cylinder about the second rotational axis responsive to receipt of data indicative of a degree of residue at the photoconductive surface.
3 more elements
Dependencies are inferred from the claim text.