# US 2021/0341845 A1 · Gamma ray generator? gamma ray lithography system and method of performing gamma ray lithography > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2021/0341845 A1 - Document ID: US20210341845A1 - Status: Published application - Kind: A1 - Application number: 17/378,801 - Filed: 2021-07-19 - Published: 2021-11-04 - Earliest claimed: 2019-07-31 - Assignees: Taiwan Semiconductor Manufacturing Company, Ltd. - Applicants: Taiwan Semiconductor Manufacturing Company, Ltd. - Inventors: You-Hua Chou; Kuo-Sheng Chuang - Web page: https://patentgrep.com/patent/US20210341845A1 ## CPC - G03F 7/70008: {Production of exposure light, i.e. light sources} - G21G 4/06: characterised by constructional features - G01T 1/16: Measuring radiation intensity (G01T1/29 takes precedence {; self-powered detectors G01T3/006; using an ionisation chamber filled with a liquid or solid, e.g. frozen liquid, dielectric G01T3/008}) - G03F 7/7005: {by multiple sources, e.g. light-emitting diodes [LED] or light source arrays (addressable array sources specially adapted to produce patterns without a mask G03F7/70391)} - G03F 7/70075: {Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection} - G03F 7/70291: {Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices} - G03F 7/70316: {Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements} - G03F 7/7035: {Proximity or contact printers} - G03F 7/70558: {Dose control, i.e. achievement of a desired dose} - G03F 7/7085: {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load} - G21G 4/00: Radioactive sources (producing neutrons or other subatomic particles, X- or gamma rays, in fusion reactors G21B, in nuclear reactors G21C, by cosmic radiation G21H7/00, in accelerators H05H; X-ray tubes H01J35/00; gamma masers H01S4/00) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - G21G: CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURCES (applications of radiation in general G21H5/00; handling particles, e.g. neutrons, or electromagnetic radiation not otherwise provided for G21K) - G01T: MEASUREMENT OF NUCLEAR OR X-RADIATION (radiation analysis of materials, mass spectrometry G01N23/00; tubes for determining the presence, intensity, density or energy of radiation or particles H01J47/00) ## Abstract A gamma ray generator includes a plate, a plurality of holes and a plurality of gamma ray sources. The plate is configured to rotate along a rotational axis. The holes are disposed in the plate, and the holes are arranged in a matrix. The gamma ray sources are respectively placed in the holes. ## Claims ### Claim 1 A gamma ray generator, comprising: a plate, configured to rotate along a rotational axis; a plurality of holes in the plate, wherein the holes are arranged in a matrix; and a plurality of gamma ray sources, respectively placed in the holes. ### Claim 2 (depends on 1) The gamma ray generator of claim 1, wherein the gamma ray sources radiate gamma rays through bottom openings of the holes, respectively. ### Claim 3 (depends on 1) The gamma ray generator of claim 1, wherein the hole has a top opening and a bottom opening opposite to the top opening, a diameter of the top opening is not less than a diameter of the gamma ray source, and a diameter of the bottom opening is less than the diameter of the gamma ray source. ### Claim 4 (depends on 1) The gamma ray generator of claim 1, wherein the hole has an upper portion and a lower portion connecting to the upper portion, and the gamma ray source is placed at an interface between the upper portion and the upper portion. ### Claim 5 (depends on 1) The gamma ray generator of claim 1, wherein a diameter of a bottom opening of the hole decreases as the hole becomes closer to the rotational axis. ### Claim 6 (depends on 1) The gamma ray generator of claim 1, wherein a separation between the holes increases as the holes become closer to the rotational axis. ### Claim 7 (depends on 1) The gamma ray generator of claim 1, wherein the holes are arranged along a plurality of concentric circular paths. ### Claim 8 A gamma ray generator, comprising: a shaft, configured to rotate along a rotational axis; a plurality of holders surrounding and connecting to the shaft; and a plurality of gamma ray sources, respectively placed in the holders. ### Claim 9 (depends on 8) The gamma ray generator of claim 8, wherein the gamma ray sources radiate gamma rays through bottom openings of the holders, respectively. ### Claim 10 (depends on 8) The gamma ray generator of claim 8, wherein the holder has a top opening and a bottom opening opposite to the top opening, and a diameter of the top opening is not less than a diameter of the gamma ray source, and a diameter of the bottom opening is less than the diameter of the gamma ray source. ### Claim 11 (depends on 8) The gamma ray generator of claim 8, wherein the holder has an upper portion and a lower portion connecting to the upper portion, and the gamma ray source is placed at an interface between the upper portion and the upper portion. ### Claim 12 A gamma ray lithography system, comprising: a gamma ray generator, comprising a plurality of gamma ray sources, wherein the gamma ray sources are arranged to surround a rotational axis; and a wafer stage, disposed below the gamma ray generator. ### Claim 13 (depends on 12) The gamma ray lithography system of claim 12, further comprising: a shutter, disposed between the gamma ray generator and the wafer stage; and a mask stage, disposed between the shutter and the wafer stage. ### Claim 14 (depends on 12) The gamma ray lithography system of claim 12, further comprising a gamma ray detector configured to detect a substantially uniform gamma ray generated by the gamma ray generator. ### Claim 15 (depends on 14) The gamma ray lithography system of claim 14, wherein the gamma ray detector and the wafer stage are disposed on opposite sides of the gamma ray generator. ### Claim 16 (depends on 14) The gamma ray lithography system of claim 14, further comprising a controller electrically connected to the gamma ray detector and the gamma ray generator. ### Claim 17 (depends on 12) The gamma ray lithography system of claim 12, wherein the gamma ray generator comprising: a main body; and a plurality of holes in the main body, wherein the holes surround the rotational axis and the gamma ray sources are placed in the holes respectively. ### Claim 18 (depends on 17) The gamma ray lithography system of claim 17, wherein the holes are arranged in a matrix. ### Claim 19 (depends on 12) The gamma ray lithography system of claim 12, wherein the gamma ray generator comprising: a shaft; and a plurality of holders surrounding and connecting to the shaft, wherein the holders surround the rotational axis and the gamma ray sources are placed in the holders respectively. ### Claim 20 (depends on 19) The gamma ray lithography system of claim 19, wherein the wafer stage is disposed directly under one of the holders.