Methods and apparatuses for aligning and diagnosing a laser beam
AssigneeCymer, Inc.
InventorDonald Harrison Barnhart
Life of this patent
Estimating the term…
Abstract
Methods and apparatuses for aligning and diagnosing the laser beam traversing an optical train in a highly space-efficient, lower cost and/or retrofit-friendly manner are disclosed. The optical components of the optical train are mounted such that one or more optical components can direct their exit laser beam to partially or wholly scan across one or more downstream sensors. Correlation data between physical disposition of optical components and the points of impact data and/or beam quality data are employed to, among others, align and/or diagnose the laser beam and/or localize failure sites and/or optimize maintenance schedule.
Claims26
A method of optimizing a laser beam of coherent collimated light in a photolithography system, the laser beam of coherent collimated light traversing an optical train comprising a plurality of optical components, the method comprising:
- moving a first optical component of the optical train such that the laser beam of coherent collimated light when exiting the first optical component scans, responsive to moving the first optical component, at least partially across a first sensor face;
- forming a correlation, using data obtained from the first sensor face during moving the first optical component, between the physical disposition of the first optical component and a point of impact of the laser beam of coherent collimated light;
- ascertaining a first physical disposition of the first optical component, using data obtained from the correlation, that would cause the point of impact of the laser beam of coherent collimated light that exits the first optical component to impact a desired point on a second optical component of the optical train;
- and
- aligning the laser beam of coherent collimated light that exits the first optical component with respect to the second optical component by disposing the first optical component in accordance with the first physical disposition.
A photolithography system having an optical train comprising a plurality of optical components, the plurality of optical components configured to at least pass a laser beam of coherent collimated light from one location to another location, comprising:
- a first optical component of the optical train configured to cause the laser beam of coherent collimated light exiting the first optical component to at least partially scan across a first sensor face;
- and
- a second optical component of the optical train configured to at least receive the laser beam of coherent collimated light that exits the first optical component and cause the laser beam of coherent collimated light exiting the second optical component to at least partially scan across a second sensor face.
A method of optimizing a laser beam of coherent collimated light in a photolithography system, the laser beam of coherent collimated light traversing an optical train that comprises a plurality of optical components, the method comprising:
- moving a first optical component of the optical train to change an amount of overlap of a footprint of the laser beam of coherent collimated light and a first sensor face;
- forming a correlation, using data obtained from the first sensor face during moving the first optical component, between the physical disposition of the first optical component and a point of impact of the laser beam of coherent collimated light;
- ascertaining a first physical disposition of the first optical component, using data obtained from the correlation, that would cause the point of impact of the laser beam of coherent collimated light that exits the first optical component to impact a desired point on a second optical component of the optical train;
- and
- aligning the laser beam of coherent collimated light that exits the first optical component with respect to the second optical component by disposing the first optical component in accordance with the first physical disposition.
A photolithography system having an optical train comprising a plurality of optical components, the plurality of optical components configured to pass a laser beam of coherent collimated light from one location to another location, the photolithography system comprising:
- a first optical component of the optical train;
- a first sensor face;
- means for moving the first optical component to change an amount of overlap of a footprint of a laser beam of coherent collimated light exiting the first optical component and the first sensor face;
- means for forming a correlation, using data obtained from the first sensor face during moving the first optical component, between the physical disposition of the first optical component and a point of impact of the laser beam of coherent collimated light;
- means for ascertaining a first physical disposition of the first optical component, using data obtained from the correlation, that would cause the point of impact of the laser beam of coherent collimated light that exits the first optical component to impact a desired point on a second optical component of the optical train;
- and
- means for aligning the laser beam of coherent collimated light that exits the first optical component with respect to the second optical component by disposing the first optical component in accordance with the first physical disposition.
Dependencies are inferred from the claim text.