# US 2021/0280450 A1 · Substrate processing apparatus

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- Number: US 2021/0280450 A1
- Document ID: US20210280450A1
- Status: Published application
- Kind: A1
- Application number: 17/184,792
- Filed: 2021-02-25
- Published: 2021-09-09
- Earliest claimed: 2020-03-09
- Assignees: Tokyo Electron Limited
- Applicants: Tokyo Electron Limited
- Inventors: Mitsuaki SATO
- Web page: https://patentgrep.com/patent/US20210280450A1

## CPC

- H10P 72/0434: {mainly by convection}
- H10P 72/7616: {characterised by a coating, a hardness or a material}
- H01J 37/32082: {Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence)}
- H01J 37/3244: {Gas supply means}
- H01J 37/32715: {Workpiece holder}
- H01J 37/32724: {Temperature}
- H10P 72/7624: {characterised by the mechanical construction of the susceptor, stage or support}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

A substrate processing apparatus that includes a chamber, a substrate support disposed in the chamber, and a connection is provided. The chamber is provided with a bottom including a first flow path, and the substrate support includes a second flow path. The connection connects the first flow path to the second flow path, and the connection includes a sleeve through which the first flow path is in fluid communication with the second flow path, and a core including a first rod segment and a first elastic foam segment. The core is disposed in the sleeve, and a gap is defined between an inner surface of the sleeve and a side surface of the first rod segment.

## Claims

### Claim 1

A substrate processing apparatus comprising:
a chamber including a bottom including a first flow path;
a substrate support disposed in the chamber, the substrate support including a second flow path; and
a connection disposed between the bottom of the chamber and the substrate support, the connection being connected to the first flow path and the second flow path, the connection including
a sleeve through which the first flow path is in fluid communication with the second flow path, and
a core disposed in the sleeve, the core including a first rod segment and a first elastic foam segment, a gap being defined between an inner surface of the sleeve and a side surface of the first rod segment.

### Claim 2 (depends on 1)

The substrate processing apparatus according to claim 1, wherein the first elastic foam segment includes open-cell foam.

### Claim 3 (depends on 2)

The substrate processing apparatus according to claim 2, wherein a Young's modulus of the first elastic foam segment is equal to or greater than 1 MPa, and is equal to or less than 3 MPa.

### Claim 4 (depends on 2)

The substrate processing apparatus according to claim 2, wherein the gap is defined by a spiral groove provided on the side surface of the first rod segment.

### Claim 5 (depends on 2)

The substrate processing apparatus according to claim 2, wherein the gap is defined by the inner surface of the sleeve in a region that faces the side surface of the first rod segment.

### Claim 6 (depends on 4)

The substrate processing apparatus according to claim 4, wherein the first elastic foam segment is disposed between the first rod segment and the substrate support.

### Claim 7 (depends on 4)

The substrate processing apparatus according to claim 4, wherein the first elastic foam segment is disposed between the first rod segment and the bottom of the chamber.

### Claim 8 (depends on 4)

The substrate processing apparatus according to claim 4, wherein
the core further includes a second elastic foam segment including open-cell foam; and
the first elastic foam segment is disposed between the first rod segment and the bottom of the chamber while the second elastic foam segment is disposed between the first rod segment and the substrate support.

### Claim 9 (depends on 4)

The substrate processing apparatus according to claim 4, wherein
the core further comprises a second rod segment; and
the first elastic foam segment is disposed between the first rod segment and the second rod segment.

### Claim 10 (depends on 1)

The substrate processing apparatus according to claim 1, further comprising a radio-frequency (RF) power source to supply RF power to the substrate support.