# US 2021/0280445 A1 · Substrate processing apparatus and substrate processing method

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- Number: US 2021/0280445 A1
- Document ID: US20210280445A1
- Status: Published application
- Kind: A1
- Application number: 17/257,637
- Filed: 2019-06-25
- Published: 2021-09-09
- Earliest claimed: 2018-07-05
- Assignees: Tokyo Electron Limited
- Applicants: Tokyo Electron Limited
- Inventors: Wataru NAKAGOMI; Tatsuya MUKOYAMA; Kazunori KAZAMA; Shigeru KUBOTA; Sho ICHINOSE; Junya CHIZUWA; Akihito KOMIYAMA; Ryuhei HIGASHIMURA
- Web page: https://patentgrep.com/patent/US20210280445A1

## CPC

- H10P 72/0612: {Production flow monitoring, e.g. for increasing throughput}
- G05B 19/41875: {characterised by quality surveillance of production}
- H10P 70/20: {Cleaning during device manufacture}
- H10P 72/0468: {comprising a chamber adapted to a particular process}
- H10P 74/23: {characterised by multiple measurements, corrections, marking or sorting processes}
- H10P 95/90: Thermal treatments, e.g. annealing or sintering
- G05B 2219/37224: Inspect wafer
- H10P 72/0456: {in-line arrangement}
- Y02P 90/02: Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- G05B: CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS (systems for controlling or regulating non-electric variables G05D; systems for regulating electric or magnetic variables G05F; control devices or systems insofar as characterised by mechanical features only G05G)
- Y02P: CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS

## Abstract

A substrate processing apparatus is provided. The substrate processing apparatus for processing substrates includes a plurality of processing modules that perform predetermined processes on the substrates, and an information display that displays information about an error that occurred in the predetermined processes. The information display displays, in the same screen, a substrate on which a predetermined process in which the error occurred, a processing module which was performing the predetermined process in which the error occurred, the timing at which the error occurred, and a main cause of the error.

## Claims

### Claim 1

A substrate processing apparatus for processing substrates, the substrate processing apparatus comprising:
a plurality of processing modules configured to perform predetermined processes on the substrates; and
an information display configured to display information about an error that occurred in the predetermined processes,
wherein the information display is configured to display, in a same screen:
a substrate on which a predetermined process in which the error occurred was being performed,
a processing module which was performing the predetermined process in which the error occurred,
a timing at which the error occurred, and
a cause of the error.

### Claim 2 (depends on 1)

The substrate processing apparatus of claim 1, wherein the plurality of processing modules are further configured to repeatedly perform a process cycle including the predetermined processes, and
wherein the information display is further configured to display, in the same screen, a cycle number of the predetermined process in which the error occurred.

### Claim 3 (depends on 2)

The substrate processing apparatus of claim 2, wherein the plurality of processing modules further comprising:
a Chemical Oxide Removal (COR) module configured to perform a COR process on a substrate; and
a heater configured to perform a heating process on the substrate, and
wherein, in the process cycle, the COR process and the heating process are sequentially performed.

### Claim 4 (depends on 1)

The substrate processing apparatus of claim 1, wherein the cause of the error is one that causes the predetermined process to be stopped and is one that occurred first.

### Claim 5

A substrate processing apparatus for processing substrates, the substrate processing apparatus comprising:
a plurality of processing modules configured to perform predetermined processes on the substrates;
a plurality of transport modules configured to transport the substrates; and
an information display configured to display information about an error that occurred in the predetermined processes or while transporting the substrates,
wherein the information display is configured to display, in a same screen:
a substrate on which a predetermined process in which the error occurred was being performed,
a processing module which was performing the predetermined process in which the error occurred, or a transport module which was transporting the substrate on which the predetermined process in which the error occurred was being performed,
a timing at which the error occurred, and
a cause of the error.

### Claim 6

A substrate processing method for processing substrates, the substrate processing method comprising:
performing predetermined processes on the substrates in a plurality of processing modules; and
displaying information about an error that occurred in the predetermined processes on an information display,
wherein the information display configured to display items in a same screen, the items comprising:
a substrate on which a predetermined process in which the error occurred was being performed,
a processing module which was performing the predetermined process in which the error occurred,
a timing at which the error occurred, and
a cause of the error.

### Claim 7 (depends on 6)

The substrate processing method of claim 6, wherein the performing the predetermined processes includes repeatedly performing a process cycle including the predetermined processes, and
wherein the displaying the information about the error includes displaying a cycle number of the predetermined process in which the error occurred in the same screen.

### Claim 8 (depends on 7)

The substrate processing method of claim 7, wherein the performing the predetermined processes further includes:
performing a COR process on a substrate;
performing a heating process on the substrate, and
wherein, in the process cycle, the COR process and the heating process are sequentially performed.

### Claim 9 (depends on 6)

The substrate processing method of claim 6, wherein the cause of the error is one that causes the predetermined process to be stopped and is one that occurred first.

### Claim 10

(canceled)