# US 2021/0278770 A1 · Semiconductor manufacturing apparatus and method of manufacturing semiconductor device > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2021/0278770 A1 - Document ID: US20210278770A1 - Status: Published application - Kind: A1 - Application number: 17/115,871 - Filed: 2020-12-09 - Published: 2021-09-09 - Earliest claimed: 2020-03-03 - Assignees: Kioxia Corporation - Applicants: Kioxia Corporation - Inventors: Sho KAWADAHARA - Web page: https://patentgrep.com/patent/US20210278770A1 ## CPC - G03F 7/70058: {Mask illumination systems} - G03F 7/70066: {Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds} - H10P 76/2041: {Photolithographic processes} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10 ## Abstract In one embodiment, a semiconductor manufacturing apparatus includes a stage on which a substrate is to be installed. The apparatus further includes a light source configured to generate light. The apparatus further includes a shaper including a rotating portion provided with an opening configured to shape the light from the light source, the shaper being configured to irradiate a photomask with the light which has passed through the opening. The apparatus further includes a controller configured to change a width of the light passing through the opening by rotating the rotating portion while scanning the substrate by the light which has passed through the photomask. ## Claims ### Claim 1 A semiconductor manufacturing apparatus comprising: a stage on which a substrate is to be installed; a light source configured to generate light; a shaper including a rotating portion provided with an opening configured to shape the light from the light source, the shaper being configured to irradiate a photomask with the light which has passed through the opening; and a controller configured to change a width of the light passing through the opening by rotating the rotating portion while scanning the substrate by the light which has passed through the photomask. ### Claim 2 (depends on 1) The apparatus of claim 1, wherein the shaper further includes a motor configured to rotate the rotating portion, and the controller rotates the rotating portion by controlling the motor. ### Claim 3 (depends on 1) The apparatus of claim 1, wherein the rotating portion has a circular sectional shape on a section vertical to a rotary axis of the rotating portion. ### Claim 4 (depends on 1) The apparatus of claim 1, wherein the opening has a quadrangular sectional shape on a section vertical to a direction in which the opening penetrates the rotating portion. ### Claim 5 (depends on 1) The apparatus of claim 1, wherein the rotating portion is formed of a material which shields the light from the light source. ### Claim 6 (depends on 1) The apparatus of claim 1, wherein the rotating portion is formed of a material which shields the light having a wavelength of 13.5 nm to 456 nm. ### Claim 7 (depends on 1) The apparatus of claim 1, further comprising a member arranged in a vicinity of the rotating portion and configured to shield the light from the light source. ### Claim 8 (depends on 1) The apparatus of claim 1, further comprising a driver configured to move the photomask while the substrate is scanned by the light which has passed through the photomask. ### Claim 9 (depends on 1) The apparatus of claim 1, wherein the stage moves the substrate such that the substrate is scanned by the light which has passed through the photomask. ### Claim 10 (depends on 1) The apparatus of claim 1, wherein the controller rotates the rotating portion, based on information regarding a pattern that is to be formed on the substrate. ### Claim 11 A method of manufacturing a semiconductor device, comprising: installing a substrate on a stage; generating light from a light source; shaping the light from the light source by an opening provided on a rotating portion of a shaper, and irradiating a photomask with the light which has passed through the opening; and changing a width of the light passing through the opening by rotating the rotating portion while scanning the substrate by the light which has passed through the photomask. ### Claim 12 (depends on 11) The method of claim 11, wherein the rotating portion is rotated by controlling a motor of the shaper. ### Claim 13 (depends on 11) The method of claim 11, wherein the rotating portion has a circular sectional shape on a section vertical to a rotary axis of the rotating portion. ### Claim 14 (depends on 11) The method of claim 11, wherein the opening has a quadrangular sectional shape on a section vertical to a direction in which the opening penetrates the rotating portion. ### Claim 15 (depends on 11) The method of claim 11, wherein the rotating portion is formed of a material which shields the light from the light source. ### Claim 16 (depends on 11) The method of claim 11, wherein the rotating portion is formed of a material which shields the light having a wavelength of 13.5 nm to 456 nm. ### Claim 17 (depends on 11) The method of claim 11, wherein a member configured to shield the light from the light source is arranged in a vicinity of the rotating portion. ### Claim 18 (depends on 11) The method of claim 11, further comprising moving the photomask while the substrate is scanned by the light which has passed through the photomask. ### Claim 19 (depends on 11) The method of claim 11, wherein the stage moves the substrate such that the substrate is scanned by the light which has passed through the photomask. ### Claim 20 (depends on 11) The method of claim 11, wherein the rotating portion is rotated, based on information regarding a pattern that is to be formed on the substrate.