Substrate processing apparatus and method
AssigneeASM IP Holding B.V.
InventorTheodorus Oosterlaken
Life of this patent
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Abstract
A substrate processing apparatus, comprising a substrate support (32) provided with a support surface (34) for supporting a substrate or a substrate carrier (24) thereon and a support heater (50) constructed and arranged to heat the support surface (34). The apparatus comprises a heat shield constructed and arranged to cover and shield the substrate support (32) when no substrate or substrate carrier (24) is on the support surface.
Claims20
A substrate processing apparatus, comprising:
- a substrate support provided with a support surface for supporting a substrate or a substrate carrier thereon and a support heater disposed below the support surface, the support heater constructed and arranged to heat the support surface, wherein:
- the apparatus comprises a heat shield constructed and arranged to cover and shield the substrate support when no substrate or substrate carrier is on the support surface;
- the heat shield at least partially forms a chamber constructed and arranged to store the substrate support therein;
- and
- the heat shield is separately and independently movable relative to the support surface of the substrate support.
The apparatus according to 1, wherein the shield comprises an upper shield and a cylindrical side shield, which shields are interconnected to define a generally cylindrical chamber to cover and shield the substrate support when no substrate or substrate carrier is on the support surface.
The apparatus according to 1, wherein the substrate support comprises an upper plate, a cylindrical side plate and a bottom plate, which plates are interconnected to define a generally cylindrical container,
- wherein an outer surface of the upper plate defines the support surface of the substrate support, and
- wherein the container defines a body that extends between the upper plate and the bottom plate, which body accommodates at least part of the support heater.
A substrate processing apparatus, comprising:
- a substrate support provided with a support surface for supporting a substrate or a substrate carrier thereon and a support heater disposed below the support surface, the support heater constructed and arranged to heat the support surface, wherein:
- the apparatus comprises a heat shield constructed and arranged to cover and shield the substrate support when no substrate or substrate carrier is on the support surface;
- and
- the heat shield is separately and independently movable relative to the support surface of the substrate support.
The apparatus according to 14, wherein the substrate support comprises an upper plate, a cylindrical side plate and a bottom plate,
- wherein an outer surface of the upper plate defines the support surface of the substrate support, and
- wherein a container defines a body that extends between the upper plate and the bottom plate, which body accommodates at least part of the support heater.
Dependencies are inferred from the claim text.