Composition useful for production of acidic gas separation membrane
AssigneeSumitomo Chemical Company, Limited
InventorsFumiaki MATSUOKA, Kensuke KAWARA
Life of this patent
Estimating the term…
Abstract
The present invention provides a composition comprising an organic compound having an acid dissociation constant in a 25° C. aqueous solution of 5.0 to 15.0, a hydrophilic resin, and a basic compound, wherein a content of the organic compound is 30 to 1,000 parts by weight per 100 parts by weight of the hydrophilic resin.
Claims15
A composition comprising an organic compound having an acid dissociation constant in a 25° C. aqueous solution of 5.0 to 15.0, a hydrophilic resin, and a basic compound, wherein
- a content of the organic compound is 30 to 1,000 parts by weight per 100 parts by weight of the hydrophilic resin.
A method for producing an acidic gas separation membrane, the method comprising coating a first porous membrane with a coating liquid to form a membrane of the coating liquid and removing water from the obtained membrane of the coating liquid, wherein
- the coating liquid comprises an organic compound having an acid dissociation constant in a 25° C. aqueous solution of 5.0 to 15.0, a hydrophilic resin, a basic compound, and water, and a content of the organic compound is 30 to 1,000 parts by weight per 100 parts by weight of the hydrophilic resin.
Dependencies are inferred from the claim text.