Split substrate interposer
AssigneeTokyo Electron Limited
InventorsArya BHATTACHERJEE, H. Jim FULFORD
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AssigneeTokyo Electron Limited
InventorsArya BHATTACHERJEE, H. Jim FULFORD
Estimating the term…
A method of forming an interposer includes providing a first interposer substrate including a first bulk material having a plurality of first through silicon vias (TSVs) extending through the first bulk material. A second interposer substrate is provided and includes a second bulk material having a plurality of second TSVs extending through the second bulk material, and a wiring plane formed on the second bulk material such that the wiring plane is electrically connected to at least one of the second TSVs. The method further includes joining the first interposer substrate to the second interposer substrate such that the wiring plane is provided as an interface wiring plane between the first and second bulk materials which electrically connects at least one of the first TSVs to at least one of the second TSVs.
A method of forming an interposer, the method comprising:
A method of forming an interposer, the method comprising:
An interposer comprising:
Dependencies are inferred from the claim text.