Split substrate interposer with integrated passive device
AssigneeTokyo Electron Limited
InventorsArya BHATTACHERJEE, H. Jim FULFORD
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AssigneeTokyo Electron Limited
InventorsArya BHATTACHERJEE, H. Jim FULFORD
Estimating the term…
A method of forming an interposer includes providing a first interposer substrate including a first bulk material having a plurality of first through silicon vias (TSVs) extending through the first bulk material. Also provided is a second interposer substrate including a second bulk material having a plurality of second TSVs extending through the second bulk material, and a wiring plane formed on the second bulk material such that the wiring plane is electrically connected to at least one of the second TSVs. The method includes connecting a passive electrical device to at least one of the first and second interposer substrates. The first interposer substrate is joined to the second interposer substrate such that the passive electrical device is provided between the first and second interposer substrates and the wiring plane is provided as an interface wiring plane between the first and second bulk materials. The interface wiring plane is electrically connected to the passive electrical device and electrically connects at least one of the first TSVs to at least one of the second TSVs.
A method of forming an interposer, the method comprising:
A method of forming an interposer, the method comprising:
An interposer comprising:
Dependencies are inferred from the claim text.