US 2021/0265177 A1 · SUBSTRATE TREATING APPARATUS

Abstract

A substrate treating apparatus includes a treatment housing, a holder, and a liquid supplying unit. The holder is accommodated in the treatment housing. The holder holds a substrate. The liquid supplying unit is accommodated in the treatment housing. The liquid supplying unit supplies a treating liquid to the substrate held by the holder. The substrate treating apparatus further includes two exhaust pipes. The exhaust pipes are each located on a lateral side of the treatment housing. The exhaust pipes each exhaust gas. The substrate treating apparatus includes a switching mechanism. The switching mechanism is located at a level equal to that of the treatment housing. The switching mechanism switches an exhaust path of the treatment housing to one of the two exhaust pipes.

Claims20

Dependent claims

A substrate treating apparatus, comprising:

a first treatment housing;
a first holder arranged inside of the first treatment housing and configured to hold a substrate;
a first liquid supplying unit arranged inside of the first treatment housing and configured to supply a treating liquid to the substrate held by the first holder;
a first exhaust pipe arranged laterally of the first treatment housing and configured to exhaust gas;
a second exhaust pipe arranged laterally of the first treatment housing and configured to exhaust gas;
and
a first switching mechanism positioned at a level equal to that of the first treatment housing and configured to switch an exhaust path of the first treatment housing to either the first exhaust pipe or the second exhaust pipe.

4 more elements

Dependencies are inferred from the claim text.

Substrate treating apparatus

Life of this patent

Substrate treating apparatus

Life of this patent

Abstract

Claims20