Ceramic sintered body and member for plasma processing apparatus
AssigneeKYOCERA Corporation
InventorManpei TANAKA
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Abstract
The ceramic sintered body of the present disclosure has yttrium oxide as a main component and contains yttrium silicate, and a ratio (I1/I0) of a maximum peak intensity I1 of yttrium silicate having a diffraction angle 2θ of 30° to 32° with respect to a maximum intensity Io of yttrium oxide having a diffraction angle 2θ of 28° to 30°, which is obtained by an X-ray diffraction method, is 0.03 or more and 0.12 or less. The member for the plasma processing apparatus is made of the ceramic sintered body, its inside is a cylindrical body which serves as a flow path for a plasma generating gas, and an inner peripheral surface of the cylindrical body contains a larger amount of yttrium silicate than an outer peripheral surface thereof.
Claims6
A ceramic sintered body comprising yttrium oxide as a main component, and containing yttrium silicate, wherein a ratio (I1/I0) of a maximum peak intensity I1 of yttrium silicate having a diffraction angle 2θ of 30° to 32° with respect to a maximum intensity I0 of yttrium oxide having a diffraction angle 2θ of 28° to 30°, obtained by an X-ray diffraction method, is 0.03 or more and 0.12 or less.
Dependencies are inferred from the claim text.