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US 2021/0265138 A1Published application
Stage, plasma processing apparatus, and plasma processing method
AssigneeTokyo Electron Limited
InventorsTaro IKEDA, Satoru KAWAKAMI, Sumi TANAKA
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Abstract
A stage includes a stage body having a placement surface and a radio-frequency electrode embedded in the stage body. The stage body is made of ceramics, and the radio-frequency electrode extends in a thickness direction of the stage body in a region below an outer periphery of the placement surface.
Claims15
A stage comprising:
- a stage body having a placement surface;
- and
- a radio-frequency electrode embedded in the stage body,
- wherein the stage body is made of ceramics, and
- the radio-frequency electrode extends in a thickness direction of the stage body in a region below an outer periphery of the placement surface.
2 more elements
A plasma processing apparatus comprising:
- a processing container configured to perform a plasma processing;
- a stage accommodated in the processing container;
- and
- a gas source configured to supply a gas for generating plasma in the processing container,
- wherein the stage includes a stage body having a placement surface, and a radio-frequency electrode embedded in the stage body,
- the stage body is made of ceramics,
- the radio-frequency electrode is disposed in a region below an outer periphery of the placement surface, and
- a maximum diameter of the placement surface is set to be smaller than a maximum diameter of a substrate to be placed on the placement surface.
5 more elements
Dependencies are inferred from the claim text.