Charged particle beam apparatus, sample alignment method of charged particle beam apparatus
AssigneeHitachi High-Tech Corporation
InventorsHironori OGAWA, Masaki MIZUOCHI, Shuichi NAKAGAWA, Motohiro TAKAHASHI
Life of this patent
Estimating the term…
Loading patent…
AssigneeHitachi High-Tech Corporation
InventorsHironori OGAWA, Masaki MIZUOCHI, Shuichi NAKAGAWA, Motohiro TAKAHASHI
Estimating the term…
A charged particle beam apparatus includes a sample stage on which a sample is mounted, a control device that controls to drive the sample stage, a linear scale that detects a position of the sample stage, laser position detection means for detecting the position of the sample stage, an optical microscope that observes the sample mounted on the sample stage, and a barrel that irradiates the sample mounted on the sample stage with an electron beam, and generates a secondary electron. Image data of a first correction sample mounted on the sample stage is acquired by the optical microscope, and position data of the sample stage is detected by the laser position detection means. The sample stage is positioned with respect to the barrel based on the image data acquired by the optical microscope and the position data of the sample stage detected by the laser position detection means.
A charged particle beam apparatus comprising:
A sample alignment method of a charged particle beam apparatus, the method comprising the following steps:
Dependencies are inferred from the claim text.