Feature amount measurement method and feature amount measurement device
AssigneeTokyo Electron Limited
InventorShinji KOBAYASHI
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Abstract
A method of measuring a feature amount of a pattern formed on a substrate and provided with periodic irregularities, includes: (A) measuring a pitch of the pattern based on a result of a scanning of a charged particle beam on the substrate; and (B) measuring other feature amounts other than the pitch of the pattern based on the result of the scanning, and correcting the measurement result of the other feature amounts based on a ratio of the measurement result of the pitch obtained in (A) to a design value of the pitch.
Claims20
A method of measuring a feature amount of a pattern formed on a substrate and provided with periodic irregularities, comprising:
- (A) measuring a pitch of the pattern based on a result of a scanning of a charged particle beam on the substrate;
- and
- (B) measuring other feature amounts other than the pitch of the pattern based on the result of the scanning, and correcting the measurement result of the other feature amounts based on a ratio of the measurement result of the pitch obtained in (A) to a design value of the pitch.
A feature amount measurement device for measuring a feature amount of a pattern formed on a substrate and provided with periodic irregularities, comprising:
- a pitch measurement part configured to measure a pitch of the pattern based on a result of a scanning of a charged particle beam on the substrate;
- and
- a feature amount measurement part configured to measure other feature amounts other than the pitch of the pattern based on the result of the scanning, and correct the measurement result of the other feature amounts based on a ratio of the measurement result of the pitch obtained by the pitch measurement part to a design value of the pitch.
Dependencies are inferred from the claim text.