Back to results
US 2021/0263431 A1Published application
Substrate support, lithographic apparatus, substrate inspection apparatus, device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJohannes Petrus Martinus Bernardus VERMEULEN, Luc Leonardus Adrianus Martinus MEULENDIJKS, Antonius Franciscus Johannes DE GROOT, Johannes Adrianus Cornelis Maria PIJNENBURG
Life of this patent
Estimating the term…
Abstract
The invention provides a substrate support for supporting a substrate, comprising: a support body, which support body comprises a support surface for supporting the substrate, a rotary dither device, which is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis which is perpendicular to the support surface.
Claims16
1-15. (canceled)
A substrate support for supporting a substrate, comprising:
- a support body comprising a support surface configured to support the substrate;
- a short stroke module;
- a long-stroke module;
- and
- a rotary dither device;
- wherein the short-stroke module is arranged to move the support body relative to the long-stroke module,
- wherein the long-stroke module is arranged to move the short-stroke module, and
- wherein the rotary dither device is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis that is perpendicular to the support surface.
5 more elements
A lithographic apparatus, comprising:
- a substrate support for supporting a substrate comprising:
- a support body comprising a support surface configured to support the substrate;
- a short stroke module;
- a long-stroke module;
- and
- a rotary dither device;
- wherein the short-stroke module is arranged to move the support body relative to the long-stroke module,
- wherein the long-stroke module is arranged to move the short-stroke module, and
- wherein the rotary dither device is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis that is perpendicular to the support surface.
6 more elements
A lithographic apparatus, comprising:
- a projection system;
- and
- a substrate positioning system configured to position a substrate relative to the projection system, the substrate positioning system comprising a substrate support for supporting the substrate, the substrate support comprising:
- a support body comprising a support surface configured to support the substrate;
- a short stroke module;
- a long-stroke module;
- and
- a rotary dither device;
- wherein the short-stroke module is arranged to move the support body relative to the long-stroke module,
- wherein the long-stroke module is arranged to move the short-stroke module, and
- wherein the rotary dither device is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis that is perpendicular to the support surface.
8 more elements
A lithographic apparatus, comprising:
- a substrate pre-alignment device comprising a substrate support for supporting a substrate, the substrate support comprising:
- a support body comprising a support surface configured to support the substrate;
- a short stroke module;
- a long-stroke module;
- and
- a rotary dither device;
- wherein the short-stroke module is arranged to move the support body relative to the long-stroke module,
- wherein the long-stroke module is arranged to move the short-stroke module, and
- wherein the rotary dither device is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis that is perpendicular to the support surface.
6 more elements
A lithographic apparatus, comprising:
- a substrate thermal stabilization device configured to stabilize a temperature of a substrate, the substrate thermal stabilization device comprising a substrate support for supporting the substrate, the substrate support comprising:
- a support body comprising a support surface configured to support the substrate;
- a short stroke module;
- a long-stroke module;
- and
- a rotary dither device;
- wherein the short-stroke module is arranged to move the support body relative to the long-stroke module,
- wherein the long-stroke module is arranged to move the short-stroke module, and
- wherein the rotary dither device is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis that is perpendicular to the support surface.
6 more elements
A substrate inspection apparatus, comprising
- a substrate support for supporting a substrate, comprising:
- a support body comprising a support surface configured to support the substrate;
- a short stroke module;
- a long-stroke module;
- and
- a rotary dither device;
- wherein the short-stroke module is arranged to move the support body relative to the long-stroke module,
- wherein the long-stroke module is arranged to move the short-stroke module, and
- wherein the rotary dither device is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis that is perpendicular to the support surface.
6 more elements
A device manufacturing method comprising:
- transferring a pattern from a patterning device onto a substrate;
- and
- using a lithographic apparatus comprising a substrate support for supporting the substrate, wherein the using comprises using the substrate support comprising:
- a support body comprising a support surface configured to support the substrate;
- a short stroke module;
- a long-stroke module;
- and
- a rotary dither device;
- wherein the short-stroke module is arranged to move the support body relative to the long-stroke module,
- wherein the long-stroke module is arranged to move the short-stroke module, and
- wherein the rotary dither device is configured to induce a relative rotary dither motion between the substrate and the support surface of the support body around a rotation axis that is perpendicular to the support surface.
8 more elements
Dependencies are inferred from the claim text.