Display device and method of fabricating the same

A display device comprising:

• a substrate;
• a first metal layer disposed on the substrate, the first metal layer including first metal parts;
• organic film patterns disposed on the substrate and positioned adjacent to lateral edges of the first metal parts of the first metal layer;
• a gate insulating pattern disposed on the first metal parts of the first metal layer and the organic film patterns;
• and
• a semiconductor pattern disposed on the gate insulating pattern,
• wherein lateral side surfaces of the gate insulating pattern protrude outward from the lateral edges of each first metal part of the first metal layer that the gate insulating pattern is disposed thereon, and
• wherein the organic film patterns directly contact lateral edges of the gate insulating pattern.

A method of fabricating a display device, the method comprising:

• stacking a first metal material layer, a gate insulating material layer and a semiconductor material layer on a substrate;
• forming a first metal layer, a gate insulating pattern and a semiconductor pattern by etching the first metal material layer, the gate insulating material layer and the semiconductor material layer;
• forming organic film patterns positioned adjacent to lateral edges of the first metal layer by coating an organic material on the substrate;
• and
• forming a second metal layer by stacking and patterning a second metal material layer on the semiconductor pattern.