Nonplanar patterned nanostructured surface and printing methods for making thereof

An apparatus for applying a pattern to a nonplanar surface having a least one portion with a radius of curvature, the apparatus comprising:

• a stamper comprising an elastomeric stamp having a first major surface, wherein the first major surface of the stamp has a relief pattern of pattern elements extending away from a base surface, and wherein each pattern element comprises a stamping surface with a lateral dimension of greater than 0 and less than about 5 microns,
• an ink absorbed into the stamping surfaces of the stamp, the ink comprising a functionalizing molecule with a functional group selected to chemically bind to the nonplanar surface;
• a first motion controller supporting the stamper and configured to move the stamp with respect to the nonplanar surface;
• and
• a second motion controller configured to move the nonplanar surface;
• wherein the first motion controller and the second motion controller move the stamp and the nonplanar surface to control a relative position of the stamping surface of the pattern elements with respect to the nonplanar surface while the major surface of the stamp contacts the nonplanar surface.

A method of applying a pattern to an exterior surface of a roller, the method comprising:

• absorbing an ink into a major surface of a stamp, the ink comprising a functionalizing molecule with a functional group selected to chemically bind to the exterior surface of the roller, wherein the major surface of the stamp comprises a relief pattern of pattern elements extending away from a base surface, and wherein each pattern element comprises a stamping surface with a lateral dimension of greater than 0 and less than about 5 microns;
• contacting the stamping surface of the pattern elements with the surface of the roller to bind the functional group with the surface of the roller to form a self-assembled monolayer (SAM) of the functionalizing material on the surface of the roller and impart the arrangement of pattern elements thereto;
• translating the major surface of the stamp with respect to the surface of the roller, wherein translating the major surface of the stamp comprises controlling a relative position of the stamping surface of the pattern elements with respect to the nonplanar surface while the major surface of the stamp contacts the nonplanar surface;
• and
• repositioning the stamp a plurality of times in a step and repeat fashion to transfer the arrangement of pattern elements to a plurality of different portions of the surface of the roller and form an array of pattern elements, wherein a stitch error between adjacent pattern elements in the array is less than about 10 μm, optionally wherein the stitch error between adjacent pattern elements in the array is less than about 1 μm.