Method for producing a transmissive optics

44:

• A method for the manufacture of a transmissive optical system (1) from a blank (2), wherein material ablation (4) is achieved on the blank (2) with an ablative laser (3), wherein, the pulse duration of the ablative laser (3) is less than 1 ns and preferably lies between 3 fs and 100 fs, or between 100 fs and 10 ps.

45:

• The method in accordance with claim 44, wherein the blank (2), initially treated with the ablative laser (3), is further processed with a polishing laser (20).

46:

• The method in accordance with claim 44, wherein a blank (40) with a circular cross-section is used, which has an optical density towards the center (41) that differs from that towards the edge (42).

47:

• The method in accordance with claim 44, wherein during processing, the process temperature is monitored and/or controlled with a pyrometer (7).

48:

• The method in accordance with claim 44, wherein the blank is symmetrically formed on one side, and on another side is processed asymmetrically or in a free-form manner.

49:

• The method in accordance with claim 44, wherein an eye of a patient is first measured and a data set is thereby generated, and the ablative laser and/or the polishing laser is subsequently controlled on the basis of the data of this data set.

50:

• The method in accordance with claim 44, wherein with the laser radiation the material of the blank is altered such that the finished lens has an optical density gradient.

51:

• The method in accordance with claim 44, wherein the optical system is an intraocular lens (IOL).

52:

• The method in accordance with claim 44, wherein the ablative laser is operated such that it effects a material ablation of of 0.02 μm to 5 μm and particularly of 0.02 μm to 0.5 μm.

53:

• The method in accordance with claim 44, wherein the ablative laser is operated with a laser wavelength of less than 400 nm, such as, in particular, between 193 nm and 370 nm.

54:

• The method in accordance with claim 44, wherein the focal diameter of the ablative laser lies between 5 and 50 μm, and preferably at approx. 20 μm.

55:

• The method in accordance with claim 44, wherein the scanning rate of the ablative laser lies between 500 and 5,000 mm/s, and preferably at approx. 1,000 mm/s.

56:

• The method in accordance with claim 44, wherein the pulse energy of the ablative laser lies between 0.1 μJ and 10 μJ, and preferably at approx. 1 μJ.

57:

• The method in accordance with claim 44, wherein the repetition rate of the ablative laser lies between 5 kHz and 5,000 kHz, and preferably between 50 kHz and 200 kHz.

58:

• The method in accordance with claim 44, wherein the polishing laser is operated with a laser wavelength between 1 and 12 μm, and particularly preferably between 9 μm and 11 μm.

59:

• The method in accordance with claim 44, wherein the polishing laser is operated continuously.

60:

• The method in accordance with claim 44, wherein the polishing laser is formed into a “quasi-line” by means of a scanning movement, with a scanning rate of 500 mm/s to 20,000 mm/s.

61:

• The method in accordance with claim 44, wherein with the polishing laser less than 30, and preferably 1 to 10, passes are carried out.

62:

• A lens manufactured in accordance with the method of claim 44, wherein the lens has a density that is at least 1% lower in one region than in another region of the lens.