# US 2021/0243858 A1 · Multi-layered radiation light source

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- Number: US 2021/0243858 A1
- Document ID: US20210243858A1
- Status: Published application
- Kind: A1
- Application number: 17/052,563
- Filed: 2019-05-24
- Published: 2021-08-05
- Earliest claimed: 2018-05-25
- Assignees: National Institute for Materials Science
- Applicants: National Institute for Materials Science
- Inventors: Tadaaki NAGAO; Tung Anh DOAN; Duy Thang DAO; Satoshi ISHII
- Web page: https://patentgrep.com/patent/US20210243858A1

## CPC

- H05B 3/0033: {Heating devices using lamps}
- H10F 39/806: {Optical elements or arrangements associated with the image sensors}
- H01K 1/04: characterised by the material thereof
- H01K 1/14: characterised by the shape
- H01K 7/00: Lamps for purposes other than general lighting (H01K9/00 - H01K13/00 take precedence)
- H05B: ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H10F: INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H01K: ELECTRIC INCANDESCENT LAMPS (details, apparatus or processes for manufacture applicable to both discharge devices and incandescent lamps H01J; light sources using a combination of incandescent and other types of light generation H01J61/96, H05B35/00)

## Abstract

Provided is a radiation light source that enables adjustment of infrared radiation to a significantly narrow band. A plasmonic reflector layer consisting of a plasmonic material, a resonator layer consisting of an insulator, and a partially reflecting layer are alternately laminated in this order to form a multi-layered radiation light source, wherein the partially reflecting layer are selected from any one of a free interface, an ultrathin-film metallic layer, and a distributed reflector layer having a structure in which layers having different refractive indexes are alternately laminated. When a material with high-temperature resistance such as SiC is used in the outermost layer of the distributed reflector layer, the multi-layered radiation light source can operate at high temperatures of 550° C. and higher.

## Claims

### Claim 1

A multi-layered radiation light source comprising
a plasmonic reflector layer,
a resonator layer consisting of an insulator layer, said resonator layer being disposed adjacent to the plasmonic reflector layer, and
a distributed reflector layer having a structure in which a plurality of types of insulator layers having different refractive indexes are alternately laminated, said distributed reflector layer being disposed on the resonator layer on the opposite side of the plasmonic reflector layer,
wherein the multi-layered radiation light source emits an infrared light from the distributed reflector layer to the outside by heating the plasmonic reflector layer.

### Claim 2

(canceled)

### Claim 3

A multi-layered radiation light source comprising
a metallic total reflecting layer,
a resonator layer consisting of an insulator layer, said resonator layer being disposed adjacent to the metallic total reflecting layer, and
a partially reflecting layer being configured to reflect part of an incident light, said partially reflecting layer being disposed on the resonator layer on the opposite side of the metallic total reflecting layer,
wherein a metal in the metallic total reflecting layer is an optical metallic material having a complex permittivity with a negative real part at a wavelength to be used, and
wherein the multi-layered radiation light source emits an infrared light from the partially reflecting layer to the outside by heating the metallic total reflecting layer.

### Claim 4 (depends on 3)

The multi-layered radiation light source according to claim 3, wherein the partially reflecting layer is an interface between the resonator layer and an external space formed by a surface of the resonator layer on the opposite side of the metallic total reflecting layer.

### Claim 5 (depends on 3)

The multi-layered radiation light source according to claim 3, wherein the partially reflecting layer is a metallic layer which reflects part of an incident light.

### Claim 6 (depends on 5)

The multi-layered radiation light source according to claim 5, wherein the metallic layer which reflects part of the incident light has high-temperature resistance.

### Claim 7 (depends on 3)

The multi-layered radiation light source according to claim 3, wherein the partially reflecting layer is a distributed reflector layer having a structure in which a plurality of types of insulator layers having different refractive indexes are alternately laminated.

### Claim 8

(canceled)

### Claim 9 (depends on 7)

The multi-layered radiation light source according to claim 7, wherein the insulator layer which constitutes the resonator layer and the insulator layer having a lower refractive index in the distributed reflector layer are composed of the same material.

### Claim 10 (depends on 7)

The multi-layered radiation light source according to claim 7, wherein the insulator layer which constitutes the resonator layer and the insulator layer having a lower refractive index in the distributed reflector layer are composed of different materials.

### Claim 11 (depends on 1)

The multi-layered radiation light source according to claim 1, wherein, in the plurality of types of insulator layers which constitute the distributed reflector layer, the insulator layer having a higher refractive index has a refractive index 1.3 times or more a refractive index of the insulator layer having a lower refractive index.

### Claim 12 (depends on 1)

The multi-layered radiation light source according to claim 1, wherein, in the plurality of types of insulator layers which constitute the distributed reflector layer, at least the insulator layer in contact with the air is composed of an oxide or SiC.

### Claim 13 (depends on 1)

The multi-layered radiation light source according to claim 1, wherein, in the distributed reflector layer, the insulator layer having a lower refractive index is a material selected from the group consisting of SiO2, Al2O3, and Si3N4, and the insulator layer having a higher refractive index is a material selected from the group consisting of Si, Ge, SiC, Ta2O5, Nb2O5, and HfO2.

### Claim 14 (depends on 1)

The multi-layered radiation light source according to claim 1, wherein the plasmonic reflector layer or the metallic total reflecting layer has high-temperature resistance.

### Claim 15 (depends on 1)

The multi-layered radiation light source according to claim 1, wherein the plasmonic reflector layer or the metallic total reflecting layer is selected from the group consisting of LaB6, Au, W, Mo, Cu alloy, Al alloy, and Ni alloy, having a complex permittivity with a negative real part, and from the group consisting of metallic nitride, metallic carbide, conductive metallic oxide, silicon carbide, silicon oxide, aluminum oxide, and metallic boride, having a complex permittivity with a negative real part in the infrared region.

### Claim 16 (depends on 15)

The multi-layered radiation light source according to claim 15, wherein the metallic carbide is selected from the group consisting of TiC and TaC.

### Claim 17 (depends on 1)

The multi-layered radiation light source according to claim 1, wherein the plasmonic reflector layer or the metallic total reflecting layer is selected from the group consisting of TiN and TaN, having a complex permittivity with a negative real part.

### Claim 18 (depends on 1)

The multi-layered radiation light source according to claim 1, wherein the plasmonic reflector layer or the metallic total reflecting layer is a transparent conductive oxide having a complex permittivity with a negative real part.

### Claim 19 (depends on 1)

The multi-layered radiation light source according to claim 1, wherein the plasmonic reflector layer or the metallic total reflecting layer is composed of a material having a FOM of 1 or more.

### Claim 20 (depends on 1)

The multi-layered radiation light source according to claim 1,
wherein a substrate is disposed on the plasmonic reflector layer or the metallic total reflecting layer on the opposite side of the resonator layer, and
wherein the plasmonic reflector layer or the metallic total reflecting layer is heated though the substrate.

### Claim 21 (depends on 20)

The multi-layered radiation light source according to claim 20, wherein the substrate or a surface of the substrate is composed of a conductor having a resistance, and the substrate or the surface of the substrate is heated by electrically energizing the substrate.

### Claim 22 (depends on 21)

The multi-layered radiation light source according to claim 21, wherein the substrate contains N-type doped SiC.

### Claim 23 (depends on 1)

The multi-layered radiation light source according to claim 1, wherein the plasmonic reflector layer or the metallic total reflecting layer is electrically energized to be heated.
