# US 2021/0242064 A1 · Electrostatic chuck heater

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- Number: US 2021/0242064 A1
- Document ID: US20210242064A1
- Status: Published application
- Kind: A1
- Application number: 17/148,865
- Filed: 2021-01-14
- Published: 2021-08-05
- Earliest claimed: 2020-02-04
- Assignees: NGK Insulators, Ltd.
- Applicants: Ngk Insulators, Ltd.
- Inventors: Joyo ITO
- Web page: https://patentgrep.com/patent/US20210242064A1

## CPC

- H10P 72/722: {Details of electrostatic chucks}
- H01J 37/32724: {Temperature}
- H10P 72/0432: {mainly by conduction}
- H10P 72/0434: {mainly by convection}
- H10P 72/72: using electrostatic chucks
- H10P 72/7614: {characterised by a plurality of individual support members, e.g. support posts or protrusions}
- H01J 2237/2007: Holding mechanisms
- H10P 72/0421: {for drying etching}
- H10P: GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H01J: ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps H01T; electric arc lamps H05B31/00; particle accelerators H05H)

## Abstract

An electrostatic chuck heater includes a ceramic plate, an electrostatic electrode, first and second zone heater electrodes, and first and second zone gas grooves. The ceramic plate includes, on its surface, a wafer placement surface. The electrostatic electrode is embedded in the ceramic plate. The first and second zone heater electrodes are embedded in the ceramic plate, corresponding to respective multiple heater zones into which the wafer placement surface is divided, and allow electric power to be individually supplied to the heater zones. Zone gas grooves are provided corresponding to respective multiple gas supply zones into which the wafer placement surface is divided independently of the heater zones, and allow a gas to be individually supplied to the gas supply zones.

## Claims

### Claim 1

An electrostatic chuck heater comprising:
a ceramic plate including, on a surface, a wafer placement surface;
an electrostatic electrode embedded in the ceramic plate;
zone heater electrodes which are embedded in the ceramic plate, corresponding to respective multiple heater zones into which the wafer placement surface is divided, and allow electric power to be individually supplied to the heater zones; and
zone gas grooves which are provided corresponding to respective multiple gas supply zones into which the wafer placement surface is divided independently of the heater zones, and allow a gas to be individually supplied to the gas supply zones.

### Claim 2 (depends on 1)

The electrostatic chuck heater according to claim 1,
wherein each of the zone heater electrodes corresponds to one or more of the zone gas grooves.

### Claim 3 (depends on 1)

The electrostatic chuck heater according to claim 1,
wherein at least one of the zone gas grooves is also provided at a section where none of the zone heater electrodes is provided.

### Claim 4 (depends on 1)

The electrostatic chuck heater according to claim 1,
wherein the zone gas groove corresponding to one of adjacent two of the zone heater electrodes overlaps with the other zone heater electrode.

### Claim 5 (depends on 1)

The electrostatic chuck heater according to claim 1,
wherein the zone gas grooves individually have a temperature measurement unit.