# US 2021/0240088 A1 · Metrology apparatus with radiation source having multiple broadband outputs > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2021/0240088 A1 - Document ID: US20210240088A1 - Status: Published application - Kind: A1 - Application number: 17/213,983 - Filed: 2021-03-26 - Published: 2021-08-05 - Earliest claimed: 2019-02-15 - Assignees: ASML Netherlands B.V. - Applicants: ASML Netherlands B.V. - Inventors: Paul William SCHOLTES - VAN EIJK; Ronald Franciscus Herman HUGERS - Web page: https://patentgrep.com/patent/US20210240088A1 ## CPC - G03F 7/7005: {by multiple sources, e.g. light-emitting diodes [LED] or light source arrays (addressable array sources specially adapted to produce patterns without a mask G03F7/70391)} - G03F 7/70625: {Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness} - G03F 7/70575: {Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength} - G03F 7/70641: {Focus} - G03F 7/70683: {Mark designs} - G03F 7/7085: {Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load} - G03F 9/7065: {Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract Disclosed is a metrology apparatus for use in a lithographic manufacturing process. The metrology apparatus comprises a radiation source comprising a drive laser having an output split into a plurality of optical paths, each comprising a respective broadband light generator. The metrology apparatus further comprises illumination optics for illuminating a structure, at least one detection system for detecting scattered radiation, having been scattered by the structure and a processor for determining a parameter of interest of the structure from the scattered radiation. ## Claims ### Claim 1 A metrology system for use in a lithographic manufacturing process, the metrology system comprising: a radiation source comprising a drive laser having an output split into a plurality of optical paths; and a plurality of metrology apparatuses comprising a respective one of a plurality of optical paths, each comprising a respective broadband light generator, the broadband light generator comprising a gas-filled hollow core photonic crystal fiber configured to generate broadband radiation; illumination optics configured to illuminate a structure on a substrate with radiation from the respective broadband light generator; a detection system configured to detect scattered radiation, having been scattered by the structure; and a processor configured to determine a parameter of interest of the structure based on the scattered radiation, wherein the metrology system is configured to output of the drive laser is split in parallel using an optical splitting device or an optical switching device and the respective broadband generators are operable in parallel to provide parallel output of the plurality of metrology apparatuses. ### Claim 2 (depends on 1) The metrology system of claim 1, wherein each of the broadband light generators comprises a supercontinuum generator. ### Claim 3 (depends on 1) The metrology system of claim 1, wherein at least two of the broadband light generators each comprise a different output property, such that a respective output spectra of radiation generated by the at least two broadband light generators is different. ### Claim 4 (depends on 1) The metrology system of claim 1, wherein at least two of the broadband light each comprise a similar output property, such that a respective output spectra of radiation generated by the at least two broadband light generators is similar. ### Claim 5 (depends on 1) The metrology system of claim 1, wherein the optical splitting device or the optical switching device comprises one of an acousto-optic modulator, an electro-optic modulator, a MEMS device, a flipping mirror device or a filter switching device. ### Claim 6 (depends on 1) The metrology system of claim 1, wherein the driver laser comprises a pulsed drive laser and the output of the drive laser is split using an optical switching device, thereby providing for the parallel output at a lower pulse frequency than the pulsed drive laser. ### Claim 7 (depends on 1) The metrology system of claim 1, wherein the optical switching device comprises one or more of: an electro-optic modulator or MEMS device, an optical beam splitter, a fiber based beam splitter, a diffraction element or a plurality of optical wedges. ### Claim 8 (depends on 1) The metrology system of claim 1, wherein one of: the optical splitting device or optical switching device splits the drive laser into fewer than five optical paths; the optical splitting device or optical switching device splits the drive laser into two optical paths; or the optical splitting device or optical switching device splits the drive laser into more than 10 of the optical paths. ### Claim 9 (depends on 1) The metrology system of claim 1, wherein each of the broadband light generators comprises a hollow core photonic crystal fiber ### Claim 10 (depends on 9) The metrology system of claim 9, wherein each hollow core photonic crystal fiber comprises a gas filling. ### Claim 11 (depends on 1) The metrology system of claim 1, comprising a common beam steering arrangement to steer the beam of the radiation from the driver laser to each broadband light generator. ### Claim 12 (depends on 1) The metrology system of claim 1, further comprising a scatterometer metrology apparatus, and a level sensor or an alignment sensor.