# US 2021/0240085 A1 · Radiation source supply system for lithographic tools > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2021/0240085 A1 - Document ID: US20210240085A1 - Status: Published application - Kind: A1 - Application number: 17/233,090 - Filed: 2021-04-16 - Published: 2021-08-05 - Earliest claimed: 2018-08-28 - Assignees: Taiwan Semiconductor Manufacturing Company, Ltd. - Applicants: Taiwan Semiconductor Manufacturing Co., Ltd. - Inventors: Chi-Hung LIAO; Yueh Lin YANG - Web page: https://patentgrep.com/patent/US20210240085A1 ## CPC - G03F 7/7015: {Details of optical elements} - G03F 7/70991: {Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum} - G03F 7/70008: {Production of exposure light, i.e. light sources} - G03F 7/70025: {by lasers} - G03F 7/702: {Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) ## Abstract Embodiments described herein provide a lithographic system having two or more lithographic tools connected to a radiation source using two or more variable attenuation units. In some embodiments, the variable attenuation unit reflects a portion of the received light beam to the lithographic tool attached thereto and transmits a remaining portion of the received light beam to the lithographic tools downstream. In some embodiments, the radiation source includes two or more laser sources to provide laser beams with an enhanced power level and which can prevent operation interruption due to laser source maintenances and repair. ## Claims ### Claim 1 A method, comprising: directing a light beam from a radiation source to a first attenuation unit including a reflector and an inlet port; by the reflector of the first attenuation unit, reflecting a first reflected portion of the light beam to a first lithographic tool, the inlet port coupled to an actuator that is operable to move the inlet port of the first attenuation unit; by the reflector of the first attenuation unit, transmitting a first transmitted portion of the light beam to a second attenuation unit connected to the first attenuation unit, the second attenuation unit including a reflector; by the reflector of the second attenuation unit, reflecting a second reflected portion of the first transmitted portion of the light beam to a second lithographic tool; varying a percentage of the first transmitted portion of the light beam reflected by the reflector of the second attenuation unit according to a power level requirement of the second lithographic tool; and adjusting, by the actuator coupled to the inlet port of the first attenuation unit, an incident angle of the light beam relative to the reflector of the first attenuation unit. ### Claim 2 (depends on 1) The method of claim 1 further comprising, by the second attenuation unit, transmitting a second portion of the light beam through the reflector of the second attenuation unit to a third attenuation unit connected to a third lithographic tool. ### Claim 3 (depends on 2) The method of claim 2, further comprising adjusting, by an actuator coupled to the reflector of the second attenuation unit, an incident angle of the second portion of light beam relative to the reflector of the second attenuation unit to adjust a percentage of the second portion of the light beam reflected by the reflector of the second attenuation unit. ### Claim 4 (depends on 2) The method of claim 2, further comprising adjusting, by an actuator coupled to an inlet port of the second attenuation unit, an incident angle of the second portion of light beam relative to the reflector of the second attenuation unit to adjust a percentage of the second portion of the light beam reflected by the reflector of the second attenuation unit. ### Claim 5 (depends on 1) The method of claim 1, further comprising generating the light beam in the radiation source, wherein generating the light beam in the radiation source comprises combining light beams generated by two or more laser radiation sources. ### Claim 6 (depends on 1) The method of claim 1, where the first portion of the light beam directed to the first lithographic tool by the first attenuation unit is in a range of about 0% to 50% of the light beam. ### Claim 7 (depends on 1) The method of claim 1, further comprising varying a percentage of the light beam directed to the first lithographic tool by the first attenuation unit according to a power level requirement of the first lithographic tool. ### Claim 8 (depends on 1) The method of claim 1, wherein the second reflected portion of the first transmitted portion of the light beam reflected to the second lithographic tool is in a range of about 0% to 50% of the first transmitted portion. ### Claim 9 A method, comprising: generating a plurality of laser light beams by a plurality of light sources; combining the plurality of laser light beams into a single combined laser light beam; directing the single combined laser light beam to a first attenuation unit including a reflector and inlet port, the first attenuation unit connected to a first lithographic tool; by the reflector of the first attenuation unit, reflecting a first reflected portion of the single combined laser light beam to the first lithographic tool, the inlet port of the first attenuation unit coupled to an actuator that is operable to move the inlet port of the first attenuation unit; by the reflector of the first attenuation unit, transmitting a first transmitted portion of the single combined laser light beam to a second attenuation unit connected to the first attenuation unit, the second attenuation unit including a reflector; by the reflector of the second attenuation unit, reflecting a second reflected portion of the first transmitted portion of the single combined laser light beam to a second lithographic tool; varying a percentage of the first transmitted portion of the single combined laser light beam reflected by the reflector of the second attenuation unit according to a power level requirement of the second lithographic tool; and adjusting, by the actuator coupled to the inlet port of the first attenuation unit, an incident angle of the single combined laser light beam relative to the reflector of the first attenuation unit. ### Claim 10 (depends on 9) The method of claim 9, further comprising adjusting an incident angle of the first transmitted portion of the single combined laser light beam relative to the reflector of the second attenuation unit to adjust a percentage of the first transmitted portion of the single combined laser light beam reflected by the reflector of the second attenuation unit. ### Claim 11 (depends on 10) The method of claim 10, wherein adjusting the incident angle of the transmitted first portion of the single combined laser light beam relative to the reflector of the second attenuation unit includes rotating the reflector of the second attenuation unit using an actuator coupled to the reflector of the second attenuation unit. ### Claim 12 (depends on 10) The method of claim 10, further comprising adjusting, by an actuator coupled to an inlet port of the second attenuation unit, an incident angle of the first transmitted portion of the single combined laser light beam relative to the reflector of the second attenuation unit to adjust a percentage of the first transmitted portion of the single combined laser light beam reflected by the reflector of the second attenuation unit. ### Claim 13 (depends on 9) The method of claim 9, wherein the first reflected portion of the single combined laser light beam directed to the first lithographic tool by the first attenuation unit is in a range of about 0% to 50% of the single combined laser light beam laser light beam. ### Claim 14 (depends on 9) The method of claim 9, wherein combining the plurality of laser light beams into a single combined laser light beam includes combining multiple laser light beams from two or more laser radiation sources by passing the multiple laser light beams from the two or more laser radiation sources through a beam position module including optics configured to combine the multiple laser light beams from the two or more laser radiation sources into a single combined laser light beam. ### Claim 15 (depends on 9) The method of claim 9, further comprising, by the second attenuation unit, transmitting a second portion (216) of the first transmitted portion of the single combined laser light beam through the reflector of the second attenuation unit to a third attenuation unit connected to a third lithographic tool. ### Claim 16 (depends on 9) The method of claim 9, wherein the adjusting the incident angle of the single combined laser light beam relative to the reflector of the first attenuation unit includes adjusting the incident angle in the range from 45 degrees to 90 degrees. ### Claim 17 An apparatus, comprising: a first attenuation unit comprising: a first housing having a first inlet port, a first reflection outlet port, and a first transmission outlet port; a first reflector disposed in the first housing, wherein the first reflector is positioned to receive a first light beam from the first inlet port, reflect a first reflected portion of the first light beam to the first reflection outlet port, and transmit a first transmitted portion of the first light beam to the first transmission outlet port; and an actuator coupled to the first inlet port, wherein the actuator is operable to move the first inlet port relative to the first reflector to change an incident angle of the first light beam from the first inlet port relative to a reflecting surface of the first reflector; a first lithographic tool; and a first optical conduit connecting the first reflection outlet port and the first lithographic tool to direct the first reflected portion of the first light beam from the first attenuation unit. ### Claim 18 (depends on 17) The apparatus of claim 17, further comprising: a second attenuation unit comprising: a second housing having a second inlet port, a second reflection outlet port, and a second transmission outlet port; a second reflector disposed in the second housing, wherein the second reflector is positioned to receive a second light beam from the second inlet port, reflect a second reflected portion of the second light beam to the second reflection outlet port, and transmit a second transmitted portion of the second light beam to the second transmission outlet port; a second lithographic tool; a second optical conduit connecting the second reflection outlet port and the second lithographic tool to direct the second reflected portion of the second light beam from the second attenuation unit; and a third optical conduit connecting the first transmission outlet port of the first attenuation unit and the second inlet port of the second attenuation unit. ### Claim 19 (depends on 17) The apparatus of claim 17, further comprising: a radiation source connected to the first inlet port of the first attenuation unit. ### Claim 20 (depends on 17) The apparatus of claim 17, wherein the percentage of the first light beam being reflected is in a range is from 0% to 50%.