# US 2021/0240084 A1 · Synthesis of superhydrophobic microporous surfaces via light-directed phtopolymerization and phase separation

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- Number: US 2021/0240084 A1
- Document ID: US20210240084A1
- Status: Published application
- Kind: A1
- Application number: 17/239,948
- Filed: 2021-04-26
- Published: 2021-08-05
- Earliest claimed: 2018-10-19
- Assignees: Syracuse University
- Inventors: Ian D. Hosein
- Web page: https://patentgrep.com/patent/US20210240084A1

## CPC

- G03F 7/2014: {Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame}
- C08J 9/28: by elimination of a liquid phase from a macromolecular composition or article, e.g. drying of coagulum
- C08J 9/365: {Coating}
- G03F 7/0048: {characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents}
- G03F 7/027: Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F7/075 takes precedence)
- G03F 7/031: Organic compounds not covered by group G03F7/029
- G03F 7/16: Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to base for photographic purposes G03C1/74)
- G03F 7/168: {Finishing the coated layer, e.g. drying, baking, soaking}
- G03F 7/2004: {characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light}
- C08J 2201/0502: the liquid phase being organic
- C08J 2205/044: Micropores, i.e. average diameter being between 0,1 micrometer and 0,1 millimeter
- C08J 2335/02: Characterised by the use of homopolymers or copolymers of esters (C08J2335/06, C08J2335/08 take precedence)
- C08J 2427/18: Homopolymers or copolymers of tetrafluoroethylene
- G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
- C08J: WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H (working, e.g. shaping, of plastics B29)

## Abstract

The formation of microporous surfaces through polymer induced phase separation in a photopolymer solvent mixture using photopolymerization via light self-focusing and self-trapping. The self-trapping of light sets fixed regions of brightness and darkness, sustained by the polymerization of light, and then wave guiding within the substrate. Phase separation occurs with the solvent phase separating in the regions of darkness and crosslinking in the regions of brightness. Upon removal of the solvent, precise and uniformly dispersed pores are created in the surface. The pore size and spacing may be tuned by adjusting the weight fraction of the photopolymer solvent mixture as well as through changes in the mask pattern.

## Claims

### Claim 1

A microporous structure, comprising a polymerized monomer having a surface defining a series of pores that have a diameter ranging from 10 to 40 micrometers and that are spaced apart from each other by a distance ranging from 50 to 100 micrometers.

### Claim 2 (depends on 1)

The structure of claim 1, wherein the microporous structure has a thickness between 100 and 400 micrometers.

### Claim 3 (depends on 1)

The structure of claim 1, wherein the monomer comprises trimethylolpropane triacrylate (TMPTA).

### Claim 4 (depends on 1)

The structure of claim 1, wherein the surface is coated with a plurality of nanoparticles.

### Claim 5 (depends on 4)

The structure of claim 4, wherein the nanoparticles comprise polytetrafluoroethylene (PTFE).

### Claim 6 (depends on 5)

The structure of claim 5, wherein the coated surface is characterized by a static water contact angle at or above 150°.