# US 2021/0239889 A1 · High Resolution Full Material Fresnel Zone Plate Array and Process for its Fabrication > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2021/0239889 A1 - Document ID: US20210239889A1 - Status: Published application - Kind: A1 - Application number: 16/324,897 - Filed: 2017-08-11 - Published: 2021-08-05 - Earliest claimed: 2016-08-12 - Assignees: Max-Planck-Gesellschaft Zur FöRderung Der Wissenschaften E. V. - Applicants: Max-Planck-Gesellschaft zur Fõrderung der Wissenschaften e V. - Inventors: Umut Tunca SANLI; Gisela SCHÜTZ; Kahraman KESKINBORA; Chengge Jiao - Web page: https://patentgrep.com/patent/US20210239889A1 ## CPC - G02B 5/1885: {Arranged as a periodic array} - C23C 16/45536: {Use of plasma, radiation or electromagnetic fields} - C23C 16/45555: {applied in non-semiconductor technology} - G02B 5/1876: {Diffractive Fresnel lenses; Zone plates; Kinoforms (G02B5/1842, G02B5/1847 take precedence; optical systems having diffractive correction means G02B27/0037; Fresnel lenses operating by refraction G02B3/08)} - G02B: OPTICAL ELEMENTS, SYSTEMS OR APPARATUS - C23C: COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion B21C23/22; covering with metal by connecting pre-existing layers to articles, see the relevant places, e.g. B21D39/00, B23K; metallising of glass C03C; metallising mortars, concrete, artificial stone, ceramics or natural stone C04B41/00; enamelling of, or applying a vitreous layer to, metals C23D; treating metal surfaces or coating of metals by electrolysis or electrophoresis C25D; single-crystal film growth C30B; by metallising textiles D06M11/83; decorating textiles by locally metallising D06Q1/04) ## Abstract The invention relates to a high resolution full material Fresnel Zone Plate array comprising a plurality of full material Fresnel Zone Plates on a common carrier, a method for producing a full material Fresnel Zone Plate precursor array by providing a common carrier comprising a plurality of micro-pillars and deposition of alternating layers of at least two different materials onto at least some of the micro-pillars and an apparatus for producing high resolution full material Fresnel Zone Plate (FZP) arrays. The apparatus for producing a full material Fresnel Zone Plate arrays, comprises a first device for providing a plurality of micro-pillars in a common carrier, a deposition device which applies alternating layers of at least two different materials onto at least some of the micro-pillars arranged on the common carrier and a slicing device which slices a full material Fresnel Zone Plate out of a pillar. ## Claims ### Claim at position 1 1-15. (canceled) ### Claim 16 A full material Fresnel Zone Plate precursor array comprising a plurality of full material Fresnel Zone Plate precursors arranged on a common carrier. ### Claim 17 (depends on 16) The full material Fresnel Zone Plate precursor array according to claim 16, wherein the full material Fresnel Zone Plate precursors are spaced apart from each other on the common carrier. ### Claim 18 (depends on 16) The full material Fresnel Zone Plate precursor array according to claim 16, wherein central axes of the full material Fresnel Zone Plate precursors are arranged parallel to each other on the common carrier. ### Claim 19 (depends on 16) The full material Fresnel Zone Plate precursor array according to claim 16, wherein the central axes of the full material Fresnel Zone Plate precursors are arranged parallel to the surface normal of the common carrier. ### Claim 20 (depends on 16) The full material Fresnel Zone Plate precursor array according to claim 16, wherein the full material Fresnel Zone Plate precursors comprise controlled tapering angles. ### Claim 21 (depends on 20) The full material Fresnel Zone Plate precursor array according to claim 20, wherein the tapering angles differ between some of the Fresnel Zone Plate precursors arranged on the same common carrier. ### Claim 22 A method for producing a full material Fresnel Zone Plate precursor array, comprising the steps: a) providing a common carrier comprising a plurality of micro-pillars, and b) depositing alternating layers of at least two different materials onto at least some of the micro-pillars. ### Claim 23 (depends on 22) The method according to claim 22, wherein the plurality of micro-pillars is produced by at least one process selected from the group comprising: focused ion beam (FIB) milling, plasma focused ion beam (Plasma-FIB) milling, spin-coating combined with Direct Laser writing or two photon photopolymerization or any other microprinting method, direct laser ablation, and a combination of any optical, electron, ion beam lithography or any directed-self-assembly or self-assembly method to form a mask layer followed by reactive ion etching (RIE), deep reactive ion etching (ORIE) or a chemical etching method. ### Claim 24 (depends on 22) The method according to claim 22, wherein depositing the alternating layers is performed via selective or non-selective atomic layer deposition (ALD). ### Claim 25 (depends on 22) The method according to claim 22, wherein depositing the alternating layers is performed simultaneously on a plurality of micro-pillars. ### Claim 26 (depends on 22) The method according to claim 22, further comprising the step of: c) detaching at least one micro-pillar from the common carrier after depositing the alternating layers on the at least one micro-pillar. ### Claim 27 (depends on 26) The method according to claim 26, wherein the detached micro-pillar is bound to a mount. ### Claim 28 (depends on 27) The method according to claim 27, wherein the mount is a TEM mount. ### Claim 29 (depends on 27) The method according to claim 27, wherein the detached micro-pillar is bound to the mount via ion beam induced metal deposition. ### Claim 30 (depends on 27) The method according to claim 27, wherein the detached micro-pillar is bound to the mount via ion beam induced Pt deposition. ### Claim 31 (depends on 22) The method according to claim 22, further comprising the step of: d) slicing a full material Fresnel Zone Plate out of a pillar after depositing the alternating layers on said pillar. ### Claim 32 (depends on 31) The method according to claim 31, wherein the slicing is performed by means of an ion beam. ### Claim 33 (depends on 22) The method according to claim 22, wherein at least some of the micro-pillars are produced to be parallel with respect to each other. ### Claim 34 (depends on 22) The method according to claim 22, wherein steps a) and b) are performed independently from each other. ### Claim 35 An apparatus for producing a full material Fresnel Zone Plate precursor array, said apparatus comprising: a) a first device for providing a plurality of micro-pillars in a common carrier, b) a deposition device which applies alternating layers of at least two different materials onto at least some of the micro-pillars arranged on the common carrier; and c) a slicing device which slices a full material Fresnel Zone Plate out of a pillar.